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  • Indium
  • Indium Metal Products
  • ST11191 Indium Rotary Target, In Target

    • ST11191 Indium Rotary Target, In Target

    Catalogue Number ST11191
    Composition In
    Purity ≥99.99%, or customized
    Form Target
    Shape Tubular
    Dimensions Customized

    Indium Rotary Target, In Target is engineered for sputtering deposition processes using high-purity indium. Stanford Advanced Materials (SAM) applies vacuum arc melting and surface analysis through scanning electron microscopy (SEM) to monitor microstructural uniformity. The manufacturing process emphasises dimensional accuracy and controlled surface finish to support consistent thin-film deposition. SAM integrates quantitative quality control methods to verify key parameters and ensure the product meets precise technical criteria.

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    FAQ

    What is the impact of the rotary design on film uniformity during sputtering?

    The rotary configuration facilitates even erosion across the target surface, which helps maintain consistent deposition rates and film thickness. This design minimises localised depletion and supports uniform thin-film properties across large substrate areas.

    How do customised dimensions influence the deposition process?

    Customized dimensions allow the target to match specific sputtering equipment, ensuring proper alignment and uniform power distribution. This reduces edge effects and contributes to the homogeneity of the deposited film.

    What quality control methods are applied to assess the target's surface integrity?

    SAM employs surface profiling via scanning electron microscopy (SEM) and in-process dimensional metrology to check surface texture and consistency. These techniques help identify microstructural irregularities prior to deployment in sputtering systems.

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