ST11193 Indium Tin Rotary Target, InSn Target

Indium Tin Rotary Target, InSn Target Description

Indium Tin Rotary Target, InSn Target is manufactured from an Indium-Tin alloy formulated for sputtering deposition in semiconductor and display manufacturing. The customisable design ensures compatibility with various coating systems while the rotary mechanism supports uniform erosion and film uniformity. Engineered with strict composition control, this target is verified through surface profiling and compositional analysis to deliver consistent sputtering performance in industrial applications.

Indium Tin Rotary Target, InSn Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Indium Tin Rotary Target, InSn Target Applications

Electronics
- Used as a sputtering target in thin film deposition for displays to achieve film uniformity by leveraging the rotary design for even erosion.
- Applied as a conductive layer in semiconductor circuits to improve electrical performance through consistent alloy composition.

Industrial
- Serves as a source in coating systems for photovoltaic cells to attain controlled electrical and optical properties using a precise In-Sn alloy composition.
- Frequently applied in surface treatments for optical components to enhance transparency and film consistency by utilising the controlled sputtering process.

Indium Tin Rotary Target, InSn Target Packing

The target is packaged in a protective, anti-static container with foam cushioning to prevent impact and contamination. A moisture-barrier bag is used to safeguard the alloy during transport and storage. Packaging ensures that environmental conditions remain stable. Custom labelling and container modifications are available to accommodate specific handling and storage requirements.

Additional Information

Indium-Tin alloys are widely used in sputtering applications due to their beneficial electrical and optical properties. The design of rotary targets often allows for consistent deposition rates, making them suitable for high-demand production environments. Advances in material synthesis and surface finishing techniques continue to improve the performance of these targets.

Understanding the metallurgical properties of InSn alloys is essential to optimising deposition parameters in industrial settings. Detailed analysis using techniques such as scanning electron microscopy and energy-dispersive spectroscopy supports process engineers in refining sputtering conditions to achieve desired film characteristics.