ST11200 Niobium Oxide Rotary Target, NbOx Target

Niobium Oxide Rotary Target, NbOx Target Description

Niobium Oxide Rotary Target, NbOx Target is developed for sputtering processes in thin film deposition. Manufactured with precision sintering techniques, the target offers controlled microstructure and compositional uniformity that contribute to consistent deposition rates. Its customisable dimensions allow integration with standard semiconductor and coating equipment. Detailed surface treatments reduce defect density, making it applicable for advanced catalytic and corrosion-resistant coating applications.

Niobium Oxide Rotary Target, NbOx Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Niobium Oxide Rotary Target, NbOx Target Applications

Electronics
- Used as a sputtering target in semiconductor thin film deposition to achieve uniform film thickness by utilising controlled microstructure.

Industrial
- Applied as a coating material in corrosion-resistant treatments to mitigate degradation by utilising its inert oxide properties.

Catalytic Processes
- Serves as a catalyst support in chemical reactors to enhance reaction efficiency by providing a stable and consistent surface.

Niobium Oxide Rotary Target, NbOx Target Packing

The target is packaged in an anti-static, foam-lined crate with inert gas purged inserts to avoid physical impact and contamination. It is sealed to minimise oxidation and stored under temperature-controlled, low-humidity conditions. Custom packaging options are available to meet specific handling and transportation requirements for controlled environments.

Additional Information

Sputtering targets play a vital role in advanced thin film deposition processes. Understanding the relationship between target composition and deposition uniformity is essential for achieving precise film characteristics. Niobium oxide, in particular, is noteworthy for its chemical stability and controlled microstructure, making it suitable for demanding industrial applications.

Advances in materials science have enabled improved synthesis techniques that enhance the performance of oxide-based targets. The rigorous quality assessments, such as X‑ray diffraction and electron microscopy, provide deeper insights into material behaviour during sputtering processes, which benefits both research and industrial manufacturing environments.