ST11202 Nickel Chromium Rotary Target, NiCr Target

Nickel Chromium Rotary Target, NiCr Target Description

Nickel Chromium Rotary Target, NiCr Target, composed of a nickel-chromium alloy, offers a rotary design that enhances material erosion uniformity during sputtering processes. The target's customisable dimensions facilitate compatibility with various deposition systems common in semiconductor and thin film applications. Its alloy composition ensures that physical and electrical properties meet the stringent requirements typically found in industrial coating and electronic component manufacturing.

Nickel Chromium Rotary Target, NiCr Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Nickel Chromium Rotary Target, NiCr Target Applications

Electronics and Semiconductor
- Used as a sputtering target in semiconductor fabrication to achieve uniform thin film coatings by leveraging its rotary design.
- Applied as a deposition component in flat panel display manufacturing to maintain consistent film thickness.

Industrial Coating
- Serves as a target in vacuum coating systems to provide protective and functional layers on industrial components by utilising its controlled erosion properties.
- Frequently used for coating components in sensor devices where precise material transfer is critical.

Nickel Chromium Rotary Target, NiCr Target Packing

The product is packaged using anti-static, shock-absorbent materials to minimise contamination and mechanical stress. Each target is sealed in a moisture-resistant pouch and placed within a protective box. Storage conditions recommend a dry, temperature-controlled environment to maintain material integrity. Custom packaging options, including labelling and compartmentalisation, are available upon request.

Additional Information

Nickel-chromium alloys have long been utilised in sputtering targets due to their balanced electrical and thermal properties. Their composition plays a crucial role in determining deposition uniformity and film adhesion in various coating processes. The rotary design of these targets offers an effective solution for managing erosion patterns over extended production cycles.

Advancements in alloy synthesis and precision machining have enabled the production of targets that meet stringent industrial standards. The integration of systematic quality control measures, such as XRF analysis, reinforces the material's suitability for high-demand applications in electronics and industrial coatings.