ST11213 Strontium Aluminate Sputtering Target, SrAl2O4 Target

Strontium Aluminate Sputtering Target, SrAl2O4 Target Description

Strontium Aluminate Sputtering Target, SrAl2O4 Target is a ceramic composition used in physical vapour deposition processes. Composed of SrAl2O4, the target is engineered to generate uniform oxide films during sputtering. Its design supports controlled erosion and minimal particulate generation. The target's precise chemical formulation and custom dimensional options ensure compatibility with standard sputtering systems, enhancing deposition consistency in manufacturing environments.

Strontium Aluminate Sputtering Target, SrAl2O4 Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Strontium Aluminate Sputtering Target, SrAl2O4 Target Applications

Electronics
- Used as a sputtering target in thin film deposition systems to achieve uniform oxide coatings by leveraging its precise chemical composition.
- Applied in semiconductor manufacturing to produce controlled dielectric layers, enhancing device performance through stable target erosion.

Industrial
- Served as a coating source for decorative and protective oxide layers in metal finishing, addressing challenges in achieving consistent deposition rates to improve surface durability.
- Frequently used for optical device manufacturing, capitalising on the controlled microstructure to realise consistent luminescence layers.

Strontium Aluminate Sputtering Target, SrAl2O4 Target Packing

The target is packaged in anti-static, rigid containers lined with foam to prevent mechanical stress and contamination. The packaging includes moisture barriers and is sealed in inert gas to maintain material integrity. Storage in a cool, dry environment is advised to avoid degradation. Customised packaging options such as vacuum sealing and compartmentalisation are available to meet specific handling requirements.

Additional Information

Sputtering targets like SrAl2O4 play a critical role in the deposition of thin films across various industrial applications. The performance of these targets can significantly influence film uniformity and electrical properties in devices ranging from semiconductors to optical coatings.

Advances in ceramic material processing have enabled more precise control over composition and microstructure, which directly impacts sputtering performance. Understanding these scientific principles is essential for optimising production processes in both research and industrial settings.