ST7954 Molybdenum Sputtering Target 99.95%, Dia. 4 inch

Molybdenum Sputtering Target 99.95%, Dia. 4 inch Description

This Molybdenum Sputtering Target is precision-crafted from 99.95% pure Mo, ensuring minimal impurities for high-quality thin-film deposition. With a 4-inch diameter, it provides ample surface area for consistently reliable sputtering processes. Molybdenum's exceptional thermal conductivity and high melting point contribute to excellent heat resistance, making it a preferred choice for demanding applications in semiconductor manufacturing, solar cells, and advanced displays. Its low coefficient of thermal expansion further enhances dimensional stability, enabling uniform and repeatable coating outcomes.

Strict quality controls govern every stage of production, from raw material selection to final inspection. Thanks to its dense microstructure and finely controlled composition, this target delivers efficient sputter rates and remarkable film uniformity. The 99.95% purity level reduces the risk of contamination, allowing research and commercial operations to achieve precise, repeatable results with confidence.

Molybdenum Sputtering Target 99.95%, Dia. 4 inch Applications

Molybdenum (Mo) sputtering targets with 99.95% purity are highly valued for their excellent thermal and electrical conductivity, high melting point, and strong corrosion resistance. This unique combination of properties makes them indispensable in various advanced applications. The 4-inch diameter format provides compatibility with a range of sputtering systems, ensuring consistent and uniform film deposition. Consequently, Mo targets serve as a critical material in thin film deposition, semiconductor manufacturing, and optical coating processes.

1. Thin Film Deposition Applications

·         PVD Coating: Molybdenum's high melting point and purity ensure reliable film deposition, offering hardness and thermal stability.

·         Magnetron Sputtering: The target's uniform structure facilitates consistent thickness control in thin film layers, enhancing device performance.

2. Semiconductor Applications

·         Integrated Circuits: Mo thin films act as diffusion barriers and conductive layers, contributing to reduced defect rates in microchip manufacturing.

·         Electronic Components: Its bonding properties help optimise performance in applications such as transistors and diodes.

3. Optical Coating Applications

·         Anti-reflective Coatings: Using Mo as a backing layer improves optical clarity while maintaining durability against harsh environments.

·         Mirror Coatings: Molybdenum's reflectivity and stability under high temperatures make it ideal for precision optical systems.

Molybdenum Sputtering Target 99.95%, Dia. 4 inch Packaging

The Molybdenum Sputtering Target 99.95% with Dia. 4 inch is carefully packaged with protective foam inserts to prevent damage. A vacuum-sealed plastic pouch protects the target from oxidation. Optional moisture-absorbent silica gel packs are included. Finally, the target is placed in a sturdy cardboard or wooden crate with labelled warning tags. Custom packaging sizes and branding can be arranged to meet specific shipping and handling needs.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99.95%, Dia. 4 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99.95%, Dia. 4 inch?

A1: Molybdenum sputtering targets with 99.95% purity are known for their excellent conductivity, stable crystalline structure, high temperature tolerance, and low vapor pressure. They have a high density (around 10.2 g/cm³), a melting point above 2 600°C, and exhibit corrosion resistance. These attributes ensure consistent, uniform film deposition, making them suitable for demanding applications such as semiconductor devices, thin-film transistors, and display coatings.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: Molybdenum sputtering targets are typically produced through powder metallurgy, starting with high-purity molybdenum powder that is compacted and sintered under tightly controlled conditions. After sintering, the material may be hot-rolled or forged to achieve uniform grain structure and improved density. Precision machining then ensures the required 4-inch diameter and specific thickness. Additional heat treatments help optimise mechanical properties and enhance sputtering performance.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99.95%, Dia. 4 inch?

A3: Molybdenum targets of 99.95% purity typically comply with ASTM B386 or equivalent industry specifications for chemical composition and mechanical properties. Many manufacturers maintain ISO 9001-certified quality management systems that govern traceability, process controls, and final inspections. In addition, RoHS and REACH compliance may be required, ensuring restricted substances are minimised. Rigorous testing, including ultrasonic inspection, dimensional verification, and compositional analysis, confirms conformance to these standards.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including Powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.