ST7956 Molybdenum Sputtering Target 99%, Dia. 4 inch

Molybdenum Sputtering Target 99%, Dia. 4 inch Description

Composed of 99.0% pure molybdenum, this 4-inch diameter sputtering target delivers excellent performance for a wide range of thin film coating applications. Molybdenum’s high melting point, superior thermal conductivity, and mechanical strength make it an appropriate choice for semiconductor, solar cell, and optical component manufacturing. Its refined microstructure ensures even film formation and reliable bonding during the sputtering process, helping to achieve uniform layers and consistent results.

Manufactured under strict quality standards, this molybdenum sputtering target meets the demanding requirements of advanced research and production environments. The balanced chemistry and low impurity content guarantee optimal deposition quality, while the precision machining ensures compatibility with various sputtering systems. Rely on this target to maintain process integrity, improve product yields, and support design goals in evolving industries.

Molybdenum Sputtering Target 99%, Dia. 4 inch Applications

Molybdenum (Mo) sputtering targets with 99% purity and a 4-inch diameter deliver erosion resistance, high-temperature stability, and consistent film deposition for advanced manufacturing processes. Being a high-density material with excellent thermal and electrical conductivity, molybdenum is a prime choice for depositing thin films in numerous industries. This introduction highlights core applications across thin film deposition, semiconductor production, and optical coating, capturing how Mo’s unique properties help achieve reliable, uniform coatings.

1. Thin Film Deposition Applications

·         PVD Coating: Molybdenum’s excellent erosion resistance ensures stable material transfer and extended target life.

·         Magnetron Sputtering: The high density of Mo helps achieve uniform thin film thickness with minimal contamination.

2. Semiconductor Applications

·         Integrated Circuits: Molybdenum’s conductivity supports reliable current flow and precise circuit connections.

·         Transistor Contacts: Mo’s stable interface properties allow for improved device performance and reduced failure rates.

3. Optical Coating Applications

·         Anti-reflective Coatings: Molybdenum layers help optimise light transmission and minimise glare.

·         Mirror Coatings: Molybdenum coatings provide enhanced reflectivity and long-term durability under challenging conditions.

Molybdenum Sputtering Target 99%, Dia. 4 inch Packaging

Each Molybdenum Sputtering Target (99%, Dia. 4 inch) is carefully sealed in a double-layer protective wrap to prevent scratches or contamination. We then place it in a vacuum-sealed polybag to ensure dryness and minimise oxidation. Finally, a rigid outer container with foam inserts prevents impact damage. Anti-oxidation materials are included to prolong shelf life. Customised packaging options are available upon request.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99%, Dia. 4 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99%, Dia. 4 inch?

A1: This sputtering target typically exhibits a high melting point of about 2623°C, excellent thermal conductivity, and exceptional resistance to heat and wear. Its density of approximately 10.2 g/cm³ and 99% purity ensure uniform composition and minimal contamination. Furthermore, the fine-grained microstructure contributes to stable sputtering rates and smooth film deposition, while its low coefficient of thermal expansion helps maintain dimensional integrity during high-temperature processes.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: The target is often produced using powder metallurgy and subsequent forming techniques. Initially, high-purity molybdenum powder is compacted or sintered under vacuum to achieve a dense material. Additional steps like hot forging or rolling may further refine the microstructure. Finally, machining operations, such as turning or grinding, ensure a precise 4-inch diameter and achieve the required surface finish for optimal sputtering performance.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99%, Dia. 4 inch?

A3: Most manufacturers adhere to ISO 9001 for overall quality management and may also comply with ASTM B386 or equivalent specifications governing molybdenum products. In certain cases, targets might meet RoHS and REACH directives to confirm restricted use of hazardous substances. Strict traceability protocols, chemical composition testing, and dimensional inspections are implemented to guarantee that each target meets product consistency and international regulatory requirements.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including Powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.