ST7957 Molybdenum Sputtering Target 99.95%, Dia. 6 inch

Molybdenum Sputtering Target 99.95%, Dia. 6 inch Description

Our Molybdenum Sputtering Target offers exceptional performance due to its high purity level of 99.95% and material properties. With a 6-inch diameter, it is engineered to deliver reliable and uniform deposition in thin film applications. Molybdenum’s notable features, such as its high melting point and excellent thermal and electrical conductivity, make this target suitable for producing films capable of withstanding extreme temperatures and harsh operational environments. Its corrosion resistance ensures a long service life and consistent film quality.

Manufactured and tested under stringent quality control standards, this Molybdenum target maintains compositional integrity and dimensional accuracy. As a result, it is commonly used in semiconductor, solar cell, and display manufacturing, where purity and consistency are essential. Whether used for thin film coatings or advanced research projects, this sputtering target provides dependable results tailored to the requirements of advanced technologies.

Molybdenum Sputtering Target 99.95%, Dia. 6 inch Applications

Molybdenum (Mo) Sputtering Target with 99.95% purity and a 6-inch diameter offers thermal stability, high melting point, and excellent conductivity. These properties make it a preferred choice for applications in thin film deposition, semiconductor manufacturing, and optical coatings. Its corrosion resistance ensures long-lasting performance in demanding environments.

1. Thin Film Deposition Applications

·         PVD Coating: Molybdenum’s high melting point and mechanical strength make it suitable for physical vapor deposition processes, ensuring uniform films and extended target life.

·         Magnetron Sputtering: Its thermal stability and low impurity levels contribute to consistent film growth, crucial for engineering and optical components.

2. Semiconductor Applications

·         Integrated Circuits: Mo’s conductivity and compatibility with silicon substrates enable reliable interconnects and diffusion barriers, enhancing circuit performance.

·         Electronic Components: Its corrosion-resistant properties help maintain device geometries, providing stable, long-term operation for various electronic parts.

3. Optical Coating Applications

·         Anti-reflective Coatings: Molybdenum’s uniform sputtering behaviour supports low-scatter, high-quality layers, improving optical clarity in lenses and sensors.

·         Mirror Coatings: With reflectivity and oxidation resistance, Mo is frequently used in multilayer mirror systems, enhancing performance in scientific and industrial instruments.

Molybdenum Sputtering Target 99.95%, Dia. 6 inch Packaging

Our Molybdenum Sputtering Target (99.95%, Dia. 6 inch) is carefully packaged with protective foam inserts to absorb shocks and maintain integrity. Each target is sealed in vacuum bags to shield against moisture and oxidation. The package includes anti-corrosion layers for extended shelf life. We offer customizable packaging solutions—such as additional metal or plastic enclosures—according to your requirements. This ensures product purity and protection throughout shipping and storage.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99.95%, Dia. 6 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99.95%, Dia. 6 inch?

A1: The Molybdenum Sputtering Target with 99.95% purity offers high density (typically 10.2 g/cm³) and boasts a melting point around 2,623°C. This high-purity composition helps maintain low levels of contaminants, minimising undesired impurities in thin film applications. With a thermal conductivity of about 138 W/mK and mechanical stability, it tolerates extended operating conditions, delivering performance in semiconductor, electronics, and optical applications.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: The Molybdenum sputtering target can be manufactured through powder metallurgy or vacuum arc-casting, followed by mechanical working steps such as forging and rolling to achieve uniform grain structure. High-temperature sintering, hot isostatic pressing, or vacuum hot pressing can ensure high density and low porosity. Finally, precision machining, grinding, and polishing are performed to achieve the 6-inch diameter, surface finish, and thickness tolerances required for consistent performance.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99.95%, Dia. 6 inch?

A3: These targets often comply with ISO 9001 requirements for manufacturing and quality management, ensuring controlled production processes and consistent performance. Purity is verified through rigorous chemical analyses like GD-MS, confirming that the material meets the 99.95% specification. Additionally, they may adhere to RoHS and REACH directives to minimise hazardous substances. Vendors also provide detailed Certificates of Analysis, guaranteeing traceability and verifying compliance with global industry standards.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.