ST7958 Molybdenum Sputtering Target 99.9%, Dia. 6 inch

Molybdenum Sputtering Target 99.9%, Dia. 6 inch Description

Our Molybdenum Sputtering Target, with an outstanding 99.9% purity and a 6-inch diameter, is regarded for its exceptional mechanical strength, high thermal conductivity, and remarkable corrosion resistance. Molybdenum’s elevated melting point of 2,623°C ensures that it remains stable under extreme temperatures, providing reliable performance in thin-film deposition processes. Its uniform density guarantees minimal defects, ensuring consistent and repeatable sputtering results.

Ideal for the microelectronics, semiconductor, and optical industries, this Molybdenum Sputtering Target meets strict quality standards, making it a trusted choice for advanced coating applications. Each target undergoes rigorous inspection and testing to maintain its purity and integrity, delivering optimal film uniformity and adhesion. With its high-quality composition and dimension precision, this target is designed to excel in demanding research and production environments.

Molybdenum Sputtering Target 99.9%, Dia. 6 inch Applications

This Molybdenum Sputtering Target 99.9% (Dia. 6 inch) offers unique thermal conductivity, high melting point, and excellent corrosion resistance that make it essential for a range of advanced manufacturing processes. Because Mo targets allow precise film formation and stable deposition rates, they are widely employed across thin film deposition, semiconductor device fabrication, and optical coating applications, driving innovation and top performance across multiple industries.

1. Thin Film Deposition Applications

·         PVD Coating: Molybdenum’s stability at high temperatures enables consistent, uniform film thickness for protective coatings.

·         Magnetron Sputtering: The target’s purity and corrosion resistance ensure precise metal layer deposition and reliable adhesion on various substrates.

2. Semiconductor Applications

·         Integrated Circuits: Its excellent electrical conductivity supports the creation of ultra-thin conductive layers for high-density circuits.

·         Electronic Components: Molybdenum’s low thermal expansion helps maintain tight tolerances in microelectronic components.

3. Optical Coating Applications

·         Anti-reflective Coatings: The target’s precise sputtering properties promote uniform optical layers for glare reduction.

·         Mirror Coatings: Its high reflectivity and stability at elevated temperatures aid in producing durable, high-quality reflective surfaces.

Molybdenum Sputtering Target 99.9%, Dia. 6 inch Packaging

Each Molybdenum Sputtering Target (99.9%, 6-inch diameter) is carefully encased in foam padding and sealed within a vacuum bag to minimise oxidation and environmental exposure. A desiccant packet is included to absorb any residual moisture, further preserving product integrity. The packaging is designed for international transportation standards and can be customised based on project requirements. Anti-oxidation measures ensure reliable performance, while vacuum packaging safeguards against contaminants throughout shipping and storage.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99.9%, Dia. 6 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99.9%, Dia. 6 inch?

A1: Molybdenum Sputtering Target 99.9%, Dia. 6 inch typically features a high melting point around 2,623°C, a density of 10.2 g/cm³, and excellent thermal and electrical conductivity. The 99.9% purity ensures minimal contamination, making it suitable for demanding applications in semiconductor and display manufacturing. Its low thermal expansion and outstanding mechanical stability further contribute to precisely controlled film properties and highly uniform sputter deposition results.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: Typical manufacturing of the Molybdenum Sputtering Target 99.9%, Dia. 6 inch involves powder metallurgy or vacuum hot pressing to achieve high density and purity. The target material may also undergo hot rolling or forging to refine grain structure and enhance mechanical integrity. Final machining and polishing steps ensure precise dimensions, surface finish, and uniform thickness, optimising the target’s performance during sputtering processes.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99.9%, Dia. 6 inch?

A3: Common standards for Molybdenum Sputtering Target 99.9%, Dia. 6 inch include compliance with ASTM B386 or B387 specifications, which govern chemical composition and mechanical integrity. Manufacturers often maintain ISO 9001 certification to ensure consistent quality and traceability. Rigorous inspection processes, including ultrasonic testing and chemical analysis, confirm purity levels and dimensional accuracy. Material certificates typically accompany each shipment, validating these quality assurances and certifications.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.