ST9138 High Purity Titanium Sputtering Target (4N5)

High Purity Titanium Sputtering Target (4N5) Description

Our High Purity Titanium Sputtering Target (4N5) is engineered to deliver exceptional performance in advanced thin film deposition processes. With a 99.995% purity level, it ensures minimal contamination and consistent, high-quality results across a range of critical applications. Each target undergoes rigorous quality control measures, including precise microstructure analysis and trace metal testing, to guarantee uniform composition and excellent adhesion properties.

This sputtering target is ideally suited for semiconductor, optical, and data storage applications, where film integrity and reliability are essential. The high purity titanium composition promotes stable, repeatable performance, enabling precise control over film thickness and electrical properties. From research laboratories to large-scale manufacturing facilities, our 4N5 Titanium Sputtering Target sets a new standard for quality, consistency, and longevity.

High Purity Titanium Sputtering Target (4N5) Applications

This high purity titanium sputtering target (4N5) boasts a remarkable level of 99.995% purity, delivering heightened corrosion resistance, excellent conductivity, and reliable film adhesion. These inherent qualities make it indispensable for advanced manufacturing, scientific research, and premium consumer products. Its precise performance aids in producing uniform coatings and durable thin films that find wide-ranging applications across many industries.

1. Industrial Applications

·         Application 1: Protective Coating for Aerospace Parts: Minimises oxidation at high temperatures, prolonging equipment lifespan.

·         Application 2: Advanced Automotive Components: Enhances hardness and wear resistance to reduce maintenance downtime.

2. Research Applications

·         Application 1: Experimental Thin Film Studies: Enables precise control of film thickness and composition for novel material exploration.

·         Application 2: Semiconductor Development: Ensures excellent conductivity for reliable microelectronic and photonic device fabrication.

3. Commercial Applications

·         Application 1: Consumer Electronics: Creates durable and scratch-resistant surfaces for smartphones and wearable devices.

·         Application 2: Architectural Glass Coatings: Provides reflective and corrosion-resistant layers to enhance window and façade longevity.

High Purity Titanium Sputtering Target (4N5) Packaging

These high-purity titanium sputtering targets (4N5) are carefully sealed in vacuum-sealed plastic pouches and placed in robust foam-padded boxes, preventing physical damage and contamination. For optimal preservation, store them in a clean, dry environment with stable temperature controls. An added protective layer minimises atmospheric exposure, ensuring purity retention. Customised packaging sizes and specialised enclosures are available to meet specific project requirements, providing added flexibility for diverse usage scenarios.

Packaging: Vacuum sealed, Wooden Box, or Customised.

High Purity Titanium Sputtering Target (4N5) FAQs

Q1: What are the key material properties of High Purity Titanium Sputtering Target (4N5)?

A1: High Purity Titanium Sputtering Target (4N5) is characterised by a minimum purity level of 99.995%, ensuring extremely low levels of metallic and non-metallic impurities. It exhibits excellent ductility, corrosion resistance, and thermal stability, which makes it ideal for thin-film deposition applications. The high purity also minimises defects in the deposited films, resulting in superior electrical and optical properties. Additionally, it has consistent grain size and uniform microstructure for optimal performance.

Q2: How should this product be handled and stored?

A2: High Purity Titanium Sputtering Target (4N5) should be handled with clean gloves to prevent contamination from oils or particulates. Avoid direct contact with bare hands or surfaces that may introduce impurities. Store the target in a sealed, moisture-free environment with stable temperature conditions and minimal humidity exposure. If cleaning is necessary, use ultrasonication in a neutral solution or isopropyl alcohol. Proper labelling and inventory management further ensure long-lasting quality and traceability.

Q3: Which quality standards and certifications apply to High Purity Titanium Sputtering Target (4N5)?

A3: High Purity Titanium Sputtering Target (4N5) typically conforms to ASTM B348 specifications for chemical composition and mechanical properties. It is also produced under rigorous ISO 9001-certified quality management systems, ensuring traceability and repeatability. Additional certification, such as a mill test report (MTR), may accompany each batch to validate purity and elemental analysis. Compliance with RoHS and REACH regulations is often guaranteed, minimising restricted substance concerns.

Related Information

1. Material Properties and Advantages

Merging refined metallurgical techniques with a stringent purification protocol, the High Purity Titanium Sputtering Target (4N5) achieves an impressive titanium content of 99.995%. This exceptional purity level ensures minimal contamination, making the target extremely valuable for the fabrication of sensitive electronic components where even the smallest impurity can compromise functionality. Alongside its elevated purity, the target provides outstanding corrosion resistance, promoting longer service life in demanding operating environments.

Offering a balanced combination of mechanical strength and ductility, this 4N5 titanium target enables precise control over sputtering deposition rates. Its well-defined grain structure, achieved through optimised processes, leads to uniform thin films during coating applications. This uniformity is critical for improved device performance, and maintaining high throughput in industrial production, reflecting the considerable advantages that come from selecting a consistently reliable titanium sputtering target.

2. Applications in Advanced Industries

Highly regarded for its versatility, the High Purity Titanium Sputtering Target (4N5) is a preferred choice in industries that demand exacting quality standards. Semiconductor companies employ it in thin-film deposition processes for microchips, where stable and uniform layers are vital for achieving precise electrical characteristics. It is also favoured in optoelectronic manufacturing when creating delicate coatings for photovoltaic cells and other high-performance components.

Renowned research institutions utilise this 4N5 titanium target in advanced research projects that focus on developing future materials. Its notable performance under high vacuum conditions enables advanced experimentation in the aerospace and biomedical fields. Beyond its immediate industrial uses, the target’s reliably consistent outputs have become a foundation for emerging technologies that rely on reproducible and defect-free coatings.