ST9139 High Purity Chromium Sputtering Target (3N5)

High Purity Chromium Sputtering Target (3N5) Description

Our High Purity Chromium Sputtering Target (3N5) is engineered with a 99.95% purity level to deliver notable performance in a variety of thin film deposition processes. Its exceptional corrosion resistance and mechanical strength make it an appropriate choice for decorative coatings, optical layers, and microelectronic applications. Through advanced manufacturing techniques, we ensure uniform composition and minimal inclusion of impurities, maintaining the highest standards of consistency throughout every target.

Each target undergoes thorough quality control measures to meet strict industry specifications. The low contamination levels significantly enhance productivity and enable precise, repeatable results across diverse sputtering environments. Backed by our commitment to research and development, this chromium target stands as a reliable solution for demanding projects that require high-quality coatings with lasting durability and excellent surface finish.

High Purity Chromium Sputtering Target (3N5) Applications

High Purity Chromium Sputtering Target (3N5) is widely recognised for its notable purity level of 99.95%, which ensures reliable performance in thin film depositions and protective coatings. Its high corrosion resistance, good conductivity, and strong adhesion properties make it essential in various industries. This sputtering target also delivers uniform coating thickness, making it ideal for research labs and commercial enterprises seeking consistent results.

1. Industrial Applications

·         Application 1: Protective coatings for high-wear machinery components, leveraging excellent corrosion resistance and stable adhesion.

·         Application 2: Conductive and reflective layers in manufacturing processes that demand uniform film deposition.

2. Research Applications

·         Application 1: Advanced thin film studies focusing on wear resistance and conductive properties in academic and corporate labs.

·         Application 2: Explorations into nanostructured materials, using its high purity to ensure minimal contamination in experiments.

3. Commercial Applications

·         Application 1: Durable decorative coatings for consumer products, achieved through uniform chromium layers.

·         Application 2: Electronics modules and sensor devices that benefit from chromium’s consistent conductivity and robust surface properties.

High Purity Chromium Sputtering Target (3N5) Packaging

Each High Purity Chromium Sputtering Target (3N5) is individually sealed in a moisture-resistant vacuum pouch and cushioned with shock-absorbing foam to prevent damage. For maximum purity, the target is placed in a clean environment, protected from dust or airborne contaminants. Store in a cool, dry area, away from direct sunlight. Custom packaging solutions are available to meet project-specific requirements and ensure secure handling throughout transport.

Packaging: Vacuum sealed, Wooden Box, or Customised.

High Purity Chromium Sputtering Target (3N5) FAQs

Q1: What are the key material properties of High Purity Chromium Sputtering Target (3N5)?

A1: High Purity Chromium Sputtering Target (3N5) typically contains 99.95% pure chromium with trace impurities well below specified limits. This advanced material features a high melting point (about 1,857°C), excellent hardness (8.5 Mohs), and good corrosion resistance. Its density is about 7.19 g/cm³, and it exhibits stable electrical conductivity. These properties make it suitable for thin film deposition, semiconductor applications, and protective coatings, delivering consistent and uniform results.

Q2: How should this product be handled and stored?

A2: Proper handling involves wearing protective gloves and using clean, lint-free materials to prevent contamination of the chromium surface. Store the target in a controlled environment with low humidity and temperature fluctuations to reduce oxidation risk. Keep it away from reactive chemicals or corrosive substances. Ensure the target remains free of dents or scratches by using padded packaging and secure transport methods.

Q3: Which quality standards and certifications apply to High Purity Chromium Sputtering Target (3N5)?

A3: High Purity Chromium Sputtering Targets (3N5) commonly meet ISO 9001 quality management standards, ensuring consistency in production and final product integrity. They may also comply with ASTM standards that define critical material characteristics like purity, density, and microstructure. Third-party certifications or inspection reports often confirm the chemical composition and trace impurity levels. Manufacturers typically perform thorough testing, including optical inspection and purity analysis, to verify compliance with these recognised global benchmarks.

Related Information

1. Material Properties and Advantages

High Purity Chromium Sputtering Target (3N5) is recognised for its notable purity level, making it an ideal choice for specialised thin-film applications. By maintaining a minimum of 99.95% chromium content, it ensures stable atomic dispersion during sputtering, which contributes to uniform film thickness and minimal impurities.

Consistent mechanical properties are another hallmark of this sputtering target, derived from its controlled microstructure. Users benefit from enhanced durability, low oxidation risk, and long service life, enabling them to achieve optimal results in advanced coating processes.

2. Applications in Advanced Industries

Aerospace engineers capitalise on the High Purity Chromium Sputtering Target (3N5) to enhance the performance of turbine blades, satellite components, and other mission-critical parts. Its notable thermal and mechanical characteristics significantly boost wear resistance and reduce the impact of corrosive elements in extreme atmospheric conditions.

Renowned semiconductor manufacturers also rely on this sputtering target for creating high-precision, protective layers in microelectronic circuits. With its notable conductivity and minimal contamination risk, it ensures consistent output and dependable device performance across various high-tech sectors.