1200C Tube Furnace for CVD OTF-1200X-HVC3 Description
The 1200C tube furnace for CVD OTF-1200X-HVC3 comprises a tube furnace from the OTF-1200X series, a precision mass flow gas control station, a high vacuum station, and other essential components. This workstation has a maximum operating temperature of 1200°C and can achieve an ultimate vacuum of 10^-4 Torr with the included sealing unit. The mass flow gas control station can mix up to three types of gases and allows the mixed gases to flow into a quartz glass tube inside the furnace. This setup is ideal for conducting experiments such as chemical vapour deposition (CVD), diffusion, and other thermal treatments under vacuum conditions and with protective gas.
1200C Tube Furnace for CVD OTF-1200X-HVC3 Specifications
Tube Furnace of the OTF-1200X
|
Furnace Construction
|
- Double-layer steel casing with air cooling.
- Built-in thermostat for automatic control of cooling above 55°C.
|
|
Process Tube
|
- Material: Fused quartz tube
- One process tube is included with the furnace.
|
|
Power
|
2.5KW, 208-240VAC, single-phase, 50/60Hz
|
|
Operating Temperature
|
- Max. Temperature: 1200℃ (1 hour); 1100℃ (continuous)
- Heating rate: ≤20℃/min
- Temperature accuracy: ±1.0℃
|
|
Heating Zone Length
|
- Total heating zone: 440mm
- Constant temperature zone: 150mm (±1°C)
|
|
Heating Elements
|
Fe-Cr-Al alloy doped with Molybdenum
|
|
Temperature Control
|
- Automatic PID control with 30 programmable segments.
- Temperature accuracy: ±1°C
- Thermocouple: Type K built into the furnace
|
|
Vacuum Seal
|
- One pair of stainless steel vacuum flanges with:
a mechanical manometer
two needle valves
a KF-25 connection for the high vacuum station
|
|
Power
|
100-110W
|
|
Rated Voltage
|
208-240VAC, single-phase, 50/60Hz
|
High Vacuum Station
|
Construction
|
Size of mobile cart: 600 (L) x 600 (W) x 700(H), mm
Max. load: 600 lbs on top
Molecular pump control panel: LCD digital
Inside: Vacuum pump
|
|
Flow Rate
|
Nitrogen N2: 33 L/s
Helium He: 39 L/s (2340L/Minute)
Hydrogen H2: 32 L/s
|
|
Working Range
|
From 1000 mbar to <1E-7 mbar
|
|
Final Pressure
|
<1E-8 mbar (without leakage)
|
Mass Flow Gas Control
|
Construction
|
Valve made of stainless steel 316
Gas mixing vessel: Φ80X120mm
600mm(L) x 745mm(W) x 700mm(H)
6" colour touch screen control panel for ease of parameter setting.
Touchscreen control and PC remote control switchable.
|
|
Power
|
23W per channel
|
|
Rated Voltage
|
AC 220V/50Hz Single-phase
|
1200C Tube Furnace for CVD OTF-1200X-HVC3 Applications
- Chemical vapour deposition (CVD): for the deposition of thin films and coatings on substrates by mixing and reacting various gases at high temperatures.
- Diffusion processes: facilitating the movement of atoms or molecules in solids, essential for semiconductor manufacturing and other materials science.
- Annealing: assists in relieving internal stresses, improving ductility and refining the microstructure of materials.
- Sintering: suitable for compacting and forming solid masses from powder-form materials without liquefying them; widely used in ceramics and metallurgy.
- Materials research: ideal for investigating the thermal properties and behaviour of various materials under controlled atmospheric conditions.
1200C Tube Furnace for CVD OTF-1200X-HVC3 Packaging
Our 1200C Tube Furnace for CVD OTF-1200X-HVC3 is carefully handled during storage and transport to maintain the quality of our product in its original condition.
Specification
OTF-1200X Series Tube Furnace
|
Furnace Structure
|
- Double-layer steel casing with air cooling.
- Built-in thermostat to control Cooling running automatically when case > 55°C.
|
|
Processing Tube
|
- Material: Fused quartz tube
- One processing tube is included with the furnace.
|
|
Power
|
2.5KW, 208-240VAC, Single Phase, 50/60Hz
|
|
Working Temp.
|
- Max. Temp: 1200℃ (1 hr); 1100℃ (continuous)
- Heating Rate: ≤20℃/min
- Temp. accuracy: ±1.0℃
|
|
Heating Zone Length
|
- Total heating zone: 440mm
- Constant Temp. Zone: 150mm (±1°C)
|
|
Heating Elements
|
Fe-Cr-Al Alloy doped by Mo
|
|
Temp. Controller
|
- PID automatic control with 30 steps programmable segments.
- Temperature accuracy: ±1°C
- Thermocouple: K type built inside the furnace
|
|
Vacuum Seal
|
- One pair of stainless steel vacuum flange with:
one mechanical pressure gauge
two needle valves
one KF-25 connector for the high vacuum station
|
|
Power
|
100-110W
|
|
Rated Voltage
|
208-240VAC, Single Phase, 50/60Hz
|
High Vacuum Station
|
Structure
|
Mobile cart size: 600 (L) x 600 (W) x 700(H), mm
Max. Loading: 600 Lbs on top
Molecular pump control Panel: LCD digital
Inside: Vacuum pump
|
|
Volume Flow Rate
|
Nitrogen N2: 33 L/s
Helium He: 39 L/s (2340L/minute)
Hydrogen H2: 32 L/s
|
|
Working Range
|
From 1000 mbar to <1E-7 mbar
|
|
Ultimate Pressure
|
<1E-8 mbar (without any leaking)
|
Mass Flow Gas Control
|
Structure
|
Made of 316 stainless steel valve
Gas mixing tank: Φ80X120mm
600mm(L) x 745mm(W) x 700mm(H)
6" color touch screen control panel to make parameter setting at easy.
Touchscreen Control and PC remote switchable.
|
|
Power
|
23W per channel
|
|
Rated Voltage
|
AC 220V/50Hz Single phase
|
CUSTOMER REVIEWS
No reviews for current products.
Write for Us
Converters & Calculators
