ST0029 Manganese (Mn) Sputtering Target

Manganese (Mn) Sputtering Target Description

The Manganese (Mn) Sputtering Target is manufactured using precise fabrication techniques to achieve excellent performance in thin film deposition processes. This target is designed for use in DC sputter systems and ensures uniform, high-quality film formation with minimal defects. Its excellent purity and customizable shapes make it highly versatile for a range of advanced coating applications. Whether in electronics, magnetic devices, or decorative applications, our target consistently meets the demanding requirements of modern manufacturing and surface engineering.

Manganese (Mn) Sputtering Target Applications

- Thin film deposition: Ideal for producing uniform coatings in semiconductor and microelectronic devices.
- Electronics: Used in the fabrication of conductive and magnetic layers for various electronic applications.
- Decorative coatings: Employed to achieve aesthetic metal surfaces with enhanced durability.
- Industrial coatings: Provides excellent wear and corrosion resistance when used for protective surface treatments.

Manganese (Mn) Sputtering Target Packing

Our Manganese (Mn) Sputtering Target is carefully packaged to maintain its high integrity during transport and storage. Products are vacuum sealed and securely packed to ensure they reach our customers in optimal condition. Custom packaging sizes are also available upon request.

Frequently Asked Questions

Q: What factors affect the lifespan of a sputtering target?
A: Lifespan depends on deposition conditions, power settings, and general process parameters during sputtering.

Q: How does the purity level of the target impact its performance?
A: A high purity level (≥99%) minimises impurities in the sputtering process and ensures uniform film properties and improved performance in the end application.

Q: Can the shape and size of the sputtering target be customised?
A: Yes, we offer custom sizes and shapes to meet the specific requirements of the sputtering system and the needs of the application.

Q: What are the benefits of using Manganese in sputtering targets?
A: Manganese provides excellent magnetic and electronic properties, making it ideal for applications requiring precise thin film structures and enhanced functional performance.

Q: How should the sputtering target be stored to maintain its quality?
A: It should be stored in a clean, dry environment, preferably in its vacuum-sealed packaging, to avoid contamination and maintain optimal performance.