ST0064 Aluminum Nickel (Al/Ni) Sputtering Target

Aluminium Nickel (Al/Ni) Sputtering Target Description

The Aluminium Nickel (Al/Ni) Sputtering Target is engineered to deliver exceptional performance for sputtering applications in various high-tech industries. Manufactured with a focus on high purity (≥99%) and precision, this target is suitable for forming uniform coatings on substrates where reliability and consistency are essential. Its customisable shapes, including standard discs or bespoke forms, meet diverse production requirements. The incorporation of specialised bonding agents such as indium and elastomer ensures that the target maintains structural integrity during the sputtering process.

Aluminium Nickel (Al/Ni) Sputtering Target Applications

· Thin Film Deposition: Widely used in the semiconductor and display industries for creating uniform and precise thin films.
· Surface Coating: Essential in processes that require high-quality, corrosion-resistant coatings for various substrates.
· Electronics: Applied in the manufacture of components where controlled film thickness and conductivity are critical.
· Research and Development: Ideal for experimental setups in material science and nanotechnology laboratories seeking high purity sputtering targets.

Aluminium Nickel (Al/Ni) Sputtering Target Packing

Our Aluminium Nickel (Al/Ni) Sputtering Targets are handled with care to preserve their high purity and precision. Each target is securely packaged in anti-static, moisture-resistant materials. Packaging options are customised to meet the specific needs of different shipping and storage environments, ensuring product integrity is maintained from our facility to your production line.

Frequently Asked Questions

Q: What industries typically use Aluminium Nickel (Al/Ni) Sputtering Targets?
A: They are mainly used in the semiconductor, display, and electronics industries, as well as in R&D laboratories focusing on advanced material applications.

Q: How does the high purity of the target benefit the sputtering process?
A: High purity ensures minimal contamination, leading to more uniform film deposition and improved performance of the final coated product.

Q: Can the shape of the sputtering target be customised?
A: Yes, our targets are available in standard discs or can be bespoke to specific shape requirements to fit various sputtering systems.

Q: What role do the bonding agents, such as indium and elastomer, play in the target?
A: They help maintain the structural integrity and connectivity of the target during the sputtering process, ensuring consistent performance under high-stress conditions.

Q: Is there any specific storage condition recommended for these sputtering targets?
A: It is recommended to store the targets in a controlled, dry environment and handle them with anti-static precautions to maintain their quality and performance.