Discontinued (Discontinued) ST0097 Molybdenum Titanium (Mo/Ti) Sputtering Target

Molybdenum-Titanium (Mo/Ti) Sputtering Target Description

The Molybdenum-Titanium (Mo/Ti) Sputtering Target has been specifically developed for advanced thin film deposition processes in sectors such as microelectronics and photovoltaics. This target is produced with an emphasis on precision and high purity, offering reliable performance and reproducible film quality, making it a key component for high-performance sputter systems. Its versatile design, available in the form of discs or custom shapes, meets various industrial requirements while ensuring durability in demanding environments.

Molybdenum-Titanium (Mo/Ti) Sputtering Target Applications

- Semiconductor manufacturing: Ideal for producing high-quality thin films in microelectronic devices.
- Photovoltaics: Utilised in the deposition of layers in solar cells to enhance efficiency and durability.
- Optical coatings: Excellent performance for anti-reflective and conductive coatings.
- Research and development: Serves as a key material for experimental sputtering studies and process optimisation.

Molybdenum-Titanium (Mo/Ti) Sputtering Target Packing

Our Molybdenum-Titanium (Mo/Ti) Sputtering Target is securely packaged to ensure its integrity during storage and transport. Custom packaging options are available to meet specific shipping and handling requirements, ensuring that the product reaches you in optimal condition.

Frequently Asked Questions

Q: What are the main advantages of an Mo/Ti sputter target compared to other materials?
A: The Mo/Ti composition offers a unique combination of high purity and tailored properties, ensuring consistent quality and performance of the thin film, particularly for demanding high-tech applications.

Q: In what forms is the sputter target available?
A: The target is available in the form of standard discs or can be customised according to your specific requirements.

Q: How does a purity level of ≥99% affect sputtering performance?
A: A high purity level minimises contamination, resulting in improved film uniformity and enhanced performance for critical applications such as microelectronics and optical coatings.

Q: Can the sputter target be used in different sputtering systems?
A: Yes, the Mo/Ti sputter target is designed to be compatible with a variety of sputtering systems, providing versatility in various manufacturing processes.

Q: What packaging options are available to ensure the safe delivery of the target?
A: We offer secure and custom packaging solutions to protect the target during transport and storage, ensuring it arrives at your facility in optimal condition.