ST0107 Nickel Vanadium (Ni/V) Sputtering Target

Nickel Vanadium (Ni/V) Sputtering Target Description

The Nickel Vanadium (Ni/V) sputtering target is designed to deliver exceptional performance for physical vapour deposition applications. This target is manufactured with a focus on high purity (≥99%) and is available in disc form or can be custom-made to fulfil specific manufacturing requirements. Its composition and the precision of its design make it a suitable choice for producing uniform thin films on substrates in modern microelectronic and optical devices. The reliable performance of this sputtering target ensures consistent deposition rates and high-quality film properties even under demanding operational conditions.

Nickel Vanadium (Ni/V) Sputtering Targets Applications

- Manufacturing of microelectronic components: Ideal for thin film deposition in semiconductor fabrication.
- Optical coatings: For the production of reflective and anti-reflective coatings for lenses and mirrors.
- Display technologies: Utilised in the development of liquid crystal displays (LCDs) and other flat panel displays.
- Solar cells: Facilitates the deposition of conductive and barrier layers for photovoltaic applications.
- Industrial precision coatings: Employed for high-performance coatings in various industrial tools and components.

Nickel Vanadium (Ni/V) Sputtering Target Packing

Our Nickel Vanadium (Ni/V) sputtering targets are handled with utmost care during storage and transport to maintain their pristine condition. The products are packaged in clean, controlled environments to ensure contamination-free shipping. Available packing options include vacuum-sealed bags for discs or custom containers that meet specific requirements.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a high-purity material used in physical vapour deposition (PVD) processes for depositing thin films onto substrates essential for semiconductor, optical, and coating applications.

Q: How is the Nickel Vanadium (Ni/V) sputtering target manufactured?
A: It is manufactured under stringent quality controls using advanced production techniques to ensure high purity and consistency, with options for custom shapes such as discs or bespoke formats.

Q: Can the target be customised for specific deposition requirements?
A: Yes, our Nickel Vanadium (Ni/V) sputtering targets are available in custom sizes and shapes to meet the specific needs of various industrial applications.

Q: In which industries can this sputtering target be used?
A: It is widely used in the manufacturing of semiconductor devices, optical coatings, display technology production, solar cell manufacturing, and other industrial precision applications.

Q: How is the quality of the sputtering target maintained during shipping?
A: The targets are packaged in cleanroom environments in vacuum-sealed or custom packaging to prevent contamination and ensure they arrive in optimal condition.