Discontinued (Discontinued) ST0114 Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target

Titanium-Aluminium-Vanadium (Ti/Al/V) Sputtering Target Description

The Titanium-Aluminium-Vanadium (Ti/Al/V) sputtering target has been developed for high-performance sputtering processes and delivers excellent and consistent film qualities. It is manufactured with precision and attention to detail, providing a customisable design tailored to specific application requirements while maintaining an excellent purity standard of ≥99%. This product is suitable for enhancing the performance of electronic devices, display technologies, and optical coatings through reliable and high-quality thin film deposition.

Titanium-Aluminium-Vanadium (Ti/Al/V) Sputtering Target Applications

- Electronics: Ideal for thin film deposition in displays, semiconductors, and other electronic components.
- Surface Coatings: Provides an excellent foundation for protective coatings ensuring durability and resistance.
- Sensors: For the manufacture of highly sensitive sensors in industry and research.
- Energy Devices: Applicable in the production of solar cells, LED modules, and other energy-related devices.

Titanium-Aluminium-Vanadium (Ti/Al/V) Sputtering Target Packing

Our Titanium-Aluminium-Vanadium sputtering target is delivered in specially designed packaging to ensure product integrity during storage and transport. The targets are securely packaged based on customer-specific requirements to ensure compatibility with various sputter system configurations.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a specialised material used as a source for thin film deposition. During the sputtering process, energetic particles bombard the target material, causing atoms to be ejected and deposited onto a substrate.

Q: What does "custom shapes" mean in relation to sputtering targets?
A: It means that the targets can be manufactured in various specific geometries and sizes based on customer requirements to ensure optimal performance for the intended application.

Q: What benefits does the Ti/Al/V composition offer for sputtering applications?
A: The Ti/Al/V composition provides a high purity level and tailored material properties, improving the uniformity and performance of thin films, making them well-suited for precision applications in electronics and coatings.

Q: Why is a purity level of ≥99% important?
A: A high purity level minimises impurities and contaminants during deposition, leading to enhanced film quality, higher conductivity, and better overall performance of the end product.

Q: Are there special storage requirements for this sputtering target?
A: Yes, it is recommended to store the sputtering targets in a cool, dry environment and to keep them in their sealed packaging to preserve their high-performance properties until use.