ST0119 Vanadium Chromium (V/Cr) Sputtering Target

Vanadium Chromium (V/Cr) Sputtering Target Description

The Vanadium-Chromium (V/Cr) Sputtering Target is manufactured under strict quality control standards to ensure a purity of ≥99% and optimal performance in sputtering processes. It is developed using high-precision techniques, offering uniform deposition and excellent adhesion, making it a key component for semiconductor fabrication and other high-tech applications. With options for standard disc shapes or custom sizes, this target provides versatility and reliability even in demanding environments.

Vanadium-Chromium (V/Cr) Sputtering Target Applications

- Semiconductor Manufacturing: Ideal for depositing ultrathin layers in microelectronic devices.
- Optical Coatings: For producing reflective and anti-reflective layers.
- Magnetic Storage: Essential for creating magnetic layers for data storage solutions.
- Surface Engineering: Ensures high-performance coatings for improved wear and corrosion resistance.
- Industrial Coatings: Suitable for decorative and protective coatings across various high-tech industries.

Vanadium Chromium (V/Cr) Sputtering Target Packing

Our Vanadium-Chromium (V/Cr) sputtering targets are securely packaged in moisture-resistant, anti-static materials to ensure their integrity during transport and storage. Standard options include vacuum-sealed packaging. Custom packaging solutions are also available upon request to meet specific industrial requirements.

Frequently Asked Questions

Q: What applications are best suited for the Vanadium-Chromium (V/Cr) Sputtering Target?
A: It is ideally suited for thin film deposition in semiconductors, optical coatings, magnetic storage devices, and various surface engineering processes.

Q: How is the purity of the V/Cr sputtering target ensured?
A: The product is manufactured under stringent quality control procedures to guarantee a purity level of ≥99% and consistent performance.

Q: Can the sputtering target be customised?
A: Yes, apart from the standard disc shape, our targets can also be custom-manufactured to meet specific dimensions and design requirements.

Q: What types of bonding are used for the target material?
A: Bonds made from Indium and elastomer are used for the target, chosen to provide optimal adhesion and functionality during sputtering.

Q: In which industries is the Vanadium-Chromium (V/Cr) sputtering target typically used?
A: Industries such as semiconductor manufacturing, optics, magnetic data storage, and various high-tech sectors benefit from our sputtering targets.