ST0121 Vanadium Tungsten (V/W) Sputtering Target

Vanadium-Tungsten (V/W) Sputtering Target Description

The Vanadium-Tungsten (V/W) sputtering target has been designed for the precise deposition of thin films and advanced material processing. Utilising high-quality V/W material with a purity level of ≥99%, this target supports consistent sputtering performance and is available in discs or custom shapes to meet specific process requirements. Its unique bonding options with Indium and elastomer ensure reliable mechanical integration, making it suitable for critical applications in semiconductor manufacturing and optical coatings.

Vanadium-Tungsten (V/W) Sputtering Target Applications

- Thin film deposition: Ideal for the production of high-quality layers used in microelectronic and optical devices.
- Semiconductor processing: Provides high reliability and uniformity, essential for modern semiconductor devices.
- Surface coatings: Suitable for advanced coatings in industrial applications requiring high precision and durability.
- Research and development: Custom shapes allow tailored solutions for innovative experimental setups and prototype development.

Vanadium-Tungsten (V/W) Sputtering Target Packing

Our Vanadium-Tungsten (V/W) sputtering target is packaged with great care to maintain its quality during storage and transport.
- Standard packaging: Securely sealed in protective packaging to prevent contamination and mechanical damage.
- Custom packaging options are available upon request to meet specific handling and logistic requirements.

Frequently Asked Questions

Q: What distinguishes a V/W sputtering target from other sputtering targets?
A: The V/W sputtering target offers unique metallic properties and high chemical stability, making it suitable for high-performance applications in thin film deposition.

Q: Can the shape of the sputtering target be customised?
A: Yes, the target is available in disc form or can be custom fabricated to meet specific design and process requirements.

Q: What bonding options are available for this product?
A: The target features a bonding option with Indium and elastomer, providing secure attachment under various operating conditions.

Q: How does purity level affect sputtering performance?
A: A purity level of ≥99% ensures minimal contamination during the deposition process, resulting in high-quality, uniform thin films.

Q: Which industries benefit most from using the V/W sputtering target?
A: Industries such as semiconductor manufacturing, optics, and microelectronics greatly benefit from the precision, reliability, and bespoke customisation options of the target.