Discontinued (Discontinued) ST0128 Zirconium Tungsten (Zr/W) Sputtering Target

Zirconium-Tungsten (Zr/W) Sputtering Target Description

The Zirconium-Tungsten (Zr/W) sputtering target is manufactured with a purity of ≥99% and is available in discs or custom configurations. This target has been developed under stringent quality control standards and is ideal for advanced physical vapour deposition processes used in semiconductor manufacturing, display fabrication, and optical coatings. Its unique Zr/W composition provides consistent deposition efficiency and withstands high stresses during sputtering, making it a reliable component for both research and industrial high-end applications.

Zirconium-Tungsten (Zr/W) Sputtering Target Applications

- Thin film deposition: Suitable for the production of semiconductors and microelectronics.
- Display technology: Ideal for the manufacturing of modern display panels.
- Optical coatings: For the deposition of high-performance optical layers and protective coatings.
- Industrial coatings: Suitable for the production of wear-resistant and corrosion-protective surfaces.
- Custom industrial processes: Tailored for specific research and manufacturing applications.

Zirconium-Tungsten (Zr/W) Sputtering Target Packing

Our Zirconium-Tungsten (Zr/W) sputtering targets are vacuum sealed and carefully packaged to maintain purity and prevent contamination during transport. Products are typically supplied in standard packaging (e.g., 5 kg per box) or customised to ensure safe and reliable delivery.

Frequently Asked Questions

Q: In which industries are Zirconium-Tungsten (Zr/W) sputtering targets commonly used?
A: Industries such as semiconductor manufacturing, display technology, and optical coating fabrication frequently use these targets due to their high performance and reliability.

Q: How is the ≥99% purity of the sputtering targets maintained?
A: Stringent quality control measures and advanced manufacturing processes ensure that each target consistently meets the high purity standards required for precision sputtering applications.

Q: Can the Zirconium-Tungsten sputtering target be customised?
A: Yes, the target is available in standard discs or can be custom fabricated to meet specific design and industrial process requirements.

Q: What bonding options are available for this sputtering target?
A: The targets come with bonding options such as Indium and elastomer, providing flexibility for various mounting and integration processes.

Q: Which sputtering methods are compatible with this target?
A: This target is designed to support a range of advanced sputter deposition techniques, making it suitable for both RF and DC sputter systems in high precision applications.