Discontinued (Discontinued) ST0130 Antimony Oxide (Sb2O3) Sputtering Target

Antimony Oxide (Sb2O3) Sputtering Target Description

The sputtering target made from antimony oxide (Sb2O3) is produced using advanced manufacturing techniques to ensure excellent sputtering performance and material consistency. With a purity of ≥99%, a melting point of 656℃, and a density of 5.2 g/cm³, this target is designed to deliver reliable results in RF sputtering systems. It is suitable for both research laboratories and large-scale production facilities, offering versatile form factors, including standard discs and custom designs for specific application requirements.

Antimony Oxide (Sb2O3) Sputtering Target Applications

- Semiconductor manufacturing: Essential for depositing high-quality thin films in integrated circuits.
- Electronic devices: For producing precise coatings for advanced electronic components.
- Optical coatings: Ideal for manufacturing optical filters and sensors.
- Surface engineering: Used in processes requiring controlled deposition for enhanced surface properties.

Antimony Oxide (Sb2O3) Sputtering Target Packing

Our antimony oxide (Sb2O3) sputtering target is carefully packaged to maintain its high purity and structural integrity during storage and transport. The products are vacuum-sealed and tailored to meet your specific size requirements to ensure optimal performance upon delivery.

Frequently Asked Questions

Q: What is the primary application of the antimony oxide (Sb2O3) sputtering target?
A: It is primarily used for the deposition of thin films in semiconductor and electronic device manufacturing, ensuring high-quality coating and performance.

Q: What does RF sputtering mean?
A: RF sputtering refers to reactive radio frequency sputtering, a method optimized for sputtering compound and oxide materials with high precision.

Q: What advantages does a high purity level (≥99%) offer for sputtering processes?
A: High purity ensures minimal contamination during deposition, resulting in consistent film quality and reliable performance in electronic applications.

Q: Can the shape of this sputtering target be customised?
A: Yes, the target is available in standard disc shapes and can also be custom-made to meet specific application requirements.

Q: What quality control measures are in place for this product?
A: Continuous monitoring and strict quality assurance protocols ensure that each target meets specified melting point, density, and purity standards, thereby guaranteeing optimal performance in your RF sputtering system.