ST0133 Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target

Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target Description

The Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target is a precision-engineered material designed for advanced thin film deposition applications. Manufactured with a focus on superior purity and consistency, this sputtering target meets the stringent requirements of microelectronics and semiconductor fabrication. Its tailored composition and customizable shape options make it ideal for specialized research and industrial processes.

Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target Applications

· Thin Film Deposition: Widely used in creating high-quality dielectric and ferroelectric thin films for microelectronic devices.
· Semiconductor Manufacturing: Essential for fabricating capacitors, resistive random-access memory (RRAM), and other semiconductor components.
· Microelectromechanical Systems (MEMS): Enables precise deposition for sensors and actuators in MEMS devices.
· Research and Development: Ideal for laboratory studies requiring advanced materials with consistent properties.

Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target Packing

Each sputtering target is carefully packaged to preserve its integrity and maintain optimal performance. Custom packaging options are available to meet specific handling and transportation requirements, ensuring the product reaches its destination in pristine condition.

Frequently Asked Questions

Q: What are the main applications of a sputtering target?
A: Sputtering targets are primarily used in thin film deposition processes for the fabrication of semiconductors, microelectronic devices, and advanced materials research.

Q: Can the sputtering target be customized in terms of size and shape?
A: Yes, the sputtering target is available in discs or custom-made shapes to suit specific manufacturing requirements.

Q: What sputtering methods are compatible with this target?
A: This target can be used with both RF and DC sputtering techniques, ensuring compatibility with a wide range of deposition systems.

Q: How does the high purity of the target benefit the sputtering process?
A: High purity minimizes impurities in the film, leading to improved performance, reliability, and overall consistency of the deposited layers.

Q: What industries can benefit from using the Ba₀.₅Sr₀.₅TiO₃ sputtering target?
A: Industries such as microelectronics, semiconductor manufacturing, MEMS, and advanced materials research can significantly benefit from this high-performance sputtering target.