ST0134 Barium Zirconate (BaZrO3) Sputtering Target

Barium Zirconate (BaZrO₃) Sputtering Target Description

The Barium Zirconate (BaZrO₃) Sputtering Target is meticulously engineered for high-quality and reliable thin film deposition. Designed for demanding industrial applications, it delivers consistent performance across both RF and DC sputtering systems. Manufactured with a purity level of ≥99%, this target is available in standard disc shapes or can be custom-made to suit specific requirements. Its robust design and excellent material properties make it ideal for advanced applications in semiconductor processing, ceramic coatings, and electronic device fabrication.

Barium Zirconate (BaZrO₃) Sputtering Target Applications

· Thin Film Deposition: Perfect for creating uniform, high-quality films in semiconductor and ceramic applications.
· Electronic Device Fabrication: Critical in the production of advanced displays, sensors, and solar cells.
· Ceramic Coatings: Provides durable, corrosion-resistant coatings for high-performance electronic components.
· Research and Development: Ideal for experimental setups requiring precise and high-purity sputtering targets.

Barium Zirconate (BaZrO₃) Sputtering Target Packing

Our Barium Zirconate Sputtering Target is packaged with the utmost care to ensure it remains in pristine condition throughout storage and transportation.
· Vacuum-sealed packaging to prevent contamination
· Custom packaging options available based on client specifications
· Standard pack sizes are tailored to meet industrial usage requirements

Frequently Asked Questions

Q: What industries benefit most from using the Barium Zirconate sputtering target?
A: Industries such as semiconductor manufacturing, electronics, ceramics, and advanced material research benefit largely from its high purity and performance in thin film deposition.

Q: How does the dual sputtering mode (RF and DC) enhance the performance of this target?
A: The dual sputtering capability allows for greater versatility and efficiency in depositing films on various substrates, optimizing process parameters for different material systems.

Q: What are the key advantages of using BaZrO₃ over other sputtering target materials?
A: BaZrO₃ offers high chemical stability, excellent structural integrity, and superior performance in harsh environments, making it ideal for precision deposition applications.

Q: Can the sputtering target be customized to meet specific project requirements?
A: Yes, the target is available in disc form or can be custom-made, allowing for flexibility to suit unique industrial applications and manufacturing processes.

Q: What quality control measures are in place during the manufacturing of the target?
A: The product undergoes rigorous quality assurance testing, including purity validation and performance testing under both RF and DC sputtering conditions, ensuring reliable and consistent output.