ST0139 Bismuth Titanate (Bi4Ti3O12) Sputtering Target

Bismuth Titanate (Bi4Ti3O12) Sputtering Target Description

The Bismuth Titanate (Bi4Ti3O12) Sputtering Target is a premium quality material engineered for sputtering applications in advanced electronics and surface coatings. Manufactured using stringent quality control measures and high-purity ingredients, this target offers consistent performance for thin-film deposition processes. Its excellent thermal stability, controlled morphology, and tailored design make it an ideal choice for research and industrial applications where precision and durability are paramount.

Bismuth Titanate (Bi4Ti3O12) Sputtering Target Applications

· Thin-Film Deposition: Widely used in the fabrication of integrated circuits, sensors, and other microelectronic devices.
· Optical Coatings: Ideal for producing high-quality optical and dielectric films.
· Advanced Coating Technologies: Suitable for applications requiring robust, durable coatings with high thermal resistance.
· Research and Development: Employed in advanced materials research where reproducibility and precision are critical.

Bismuth Titanate (Bi4Ti3O12) Sputtering Target Packing

Our Bismuth Titanate Sputtering Target is carefully packaged under controlled conditions to ensure its quality and integrity are maintained throughout transit. Standard packaging options include secure, moisture-resistant containers suitable for laboratory and industrial use. Customized packaging solutions are available upon request.

Frequently Asked Questions

Q: What makes Bismuth Titanate (Bi4Ti3O12) suitable for sputtering applications?
A: Its high purity, excellent thermal stability, and controlled morphology provide consistent and reliable performance during thin-film deposition.

Q: Can the target be manufactured in customized shapes?
A: Yes, the Bismuth Titanate Sputtering Target is available in discs or can be custom-made to meet specific design requirements.

Q: How does the high melting point of 1203℃ benefit the sputtering process?
A: The high melting point ensures that the target maintains its structural integrity and performance even under high-temperature operating conditions.

Q: What industries commonly use this sputtering target?
A: It is widely used in electronics, optical coatings, and advanced material research, as well as in the manufacturing of integrated circuits and sensors.

Q: Are there specific handling or storage requirements for this material?
A: Yes, it should be stored in a controlled environment, avoiding moisture and contaminants, to preserve its high purity and performance characteristics.