ST0140 Cerium Oxide (CeO2) Sputtering Target

Cerium Oxide (CeO2) Sputtering Target Description

The sputtering target made of Cerium Oxide (CeO2) is a high-performance material developed for advanced thin film deposition applications. This target is produced using state-of-the-art manufacturing techniques, ensuring uniform energy distribution and consistent film quality during sputtering. Due to its excellent thermal stability and oxidation resistance, it is particularly suitable for applications in the semiconductor, optics, and ceramics industries. Custom shapes and sizes allow for versatile integration into various deposition systems, providing reliable and efficient performance in demanding industrial environments.

Cerium Oxide (CeO2) Sputtering Target Applications

- Thin film deposition: Ideal for semiconductor devices and optical coatings.
- Surface modification: Enhances wear resistance and provides corrosion protection.
- Advanced coatings: Used for technical surfaces for catalyst carriers, sensors, and energy devices.
- Optoelectronics: Employed in the manufacture of displays and photovoltaic cells.

Cerium Oxide (CeO2) Sputtering Target Packing

Our Cerium Oxide (CeO2) sputtering target is carefully packaged to ensure its integrity during transportation and storage. Typically, they are vacuum sealed or packaged in custom packaging specifically designed for configuration and size requirements.

Frequently Asked Questions

Q: What is the primary application of the Cerium Oxide (CeO₂) sputtering target?
A: It is primarily used for the deposition of thin films in the semiconductor industry, in optics, and for high-tech coatings.

Q: Which sputtering methods are compatible with this target?
A: The target is optimised for RF and RF-R sputtering processes.

Q: Can I request a custom size or shape for the target?
A: Yes, the target is available in custom sizes, including standard discs or other tailored configurations.

Q: How does a purity level of ≥99% affect performance?
A: A high purity level ensures consistent sputtering performance and excellent film quality, as impurities during the deposition process are minimised.

Q: Which industries benefit the most from the use of this sputtering target?
A: Industries such as semiconductor manufacturing, optics, ceramics, and advanced coating applications greatly benefit from its precision and high-performance characteristics.