ST0142 Cobalt Oxide (CoO) Sputtering Target

Cobalt Oxide (CoO) Sputtering Target Description

The Cobalt Oxide (CoO) Sputtering Target is specifically designed to meet the demanding requirements of modern sputtering applications. Manufactured with a purity of ≥99%, this target ensures consistent performance and reliability for applications requiring high thermal stability. Its design supports both DC-R and RF-R sputtering processes, making it versatile for a wide range of industrial applications. The option for custom shapes, including discs and tailored forms, allows for optimal integration into various sputtering systems.

Cobalt Oxide (CoO) Sputtering Target Applications

- Semiconductor manufacturing: Provides a reliable material for the deposition of thin films in high-precision semiconductor devices.
- Thin film deposition: Ideal for applications in solar cells, optical coatings, and other high-end electronic devices.
- Display technologies: Supports the production of high-performance displays and touchscreens with uniform film deposition.
- MEMS manufacturing: Enables the production of micro-electromechanical systems with precise material properties.
- Advanced coatings: Suitable for creating wear-resistant and specialized coatings for industrial components.

Cobalt Oxide (CoO) Sputtering Target Packing

Our Cobalt Oxide (CoO) Sputtering Target is carefully packed to ensure it reaches you in perfect condition. The product is available in vacuum-sealed packaging, with options for custom packaging to meet specific project requirements.

Frequently Asked Questions

Q: What is the composition of the sputtering target?
A: The target consists of Cobalt Oxide (CoO) with a purity of ≥99%.

Q: Which sputtering methods is this target compatible with?
A: It is compatible with both DC-R and RF-R sputtering techniques, making it suitable for various deposition processes.

Q: Can I request a custom shape for the target?
A: Yes, the target is available in disc form or can be custom-made according to specific requirements.

Q: What are the main applications of the Cobalt Oxide sputtering target?
A: It is commonly used in semiconductor manufacturing, thin film deposition, display technology, MEMS fabrication, and advanced coating applications.

Q: How does the high melting point positively impact the sputtering process?
A: With a melting point of 1935℃, the target exhibits excellent thermal stability under high-temperature sputtering conditions, thereby ensuring consistent performance.