ST0144 Copper Aluminum Oxide (CuAlO2) Sputtering Target

Copper-Aluminium-Oxide (CuAlO2) Sputtering Target Description

The Copper-Aluminium Oxide (CuAlO2) sputtering target has been designed for high-performance sputtering applications requiring uniform thin films. It is manufactured with high purity and precision, resulting in consistent sputtering efficiency due to its optimised morphology and metallurgical properties. Its carefully formulated composition ensures excellent adhesion and durability across a variety of sputtering systems. This target is ideal for semiconductor manufacturing, display technologies, and advanced surface coatings, providing a versatile solution for contemporary manufacturing processes.

Copper-Aluminium-Oxide (CuAlO2) Sputtering Target Applications

- Semiconductor Industry: For the deposition of thin layers in the fabrication of integrated circuits.
- Display Technologies: Used in the production of OLED and LCD panels to enhance visual performance.
- Surface Engineering: For the creation of durable, wear-resistant, and conductive coatings on various substrates.
- Research and Development: Serves as a reliable material for experimental coatings and advanced material studies.

Copper-Aluminium-Oxide (CuAlO2) Sputtering Target Packing

Our Copper-Aluminium Oxide (CuAlO2) sputtering target is carefully packaged to maintain its original quality during transport and storage. Standard packaging options include vacuum-sealed containers for discs, while custom packaging solutions are also available to meet specific customer requirements.

Frequently Asked Questions

Q: What sputtering methods are compatible with this target?
A: This sputtering target supports both RF and DC sputtering methods, providing flexibility for various deposition processes.

Q: How is the high purity (≥99%) of the target ensured?
A: The target is produced under stringent quality control protocols, which guarantee that each unit meets the high purity standards required for optimal sputtering performance.

Q: Are custom shapes available in addition to standard targets?
A: Yes, the target can be manufactured in specific dimensions and shapes according to customer requirements.

Q: In which industries is the Copper-Aluminium oxide sputtering target commonly used?
A: It is frequently utilised in semiconductor manufacturing, display technology, and surface engineering, as well as for various research and development projects.

Q: How do I choose between RF and DC sputtering for my application?
A: The choice between RF and DC sputtering depends on specific coating requirements and the characteristics of the substrate material. Technical consultation is recommended to determine the optimal method.