Discontinued (Discontinued) ST0151 Indium Gallium Zinc Oxide (IGZO) Sputtering Target

IGZO Sputtering Target Description

The Indium-Gallium-Zinc-Oxide (IGZO) sputtering target is designed to achieve exceptional performance in thin film deposition processes. Manufactured with a precise composition of In2O3, Ga2O3, and ZnO with a purity of ≥99%, this target ensures uniform and reliable sputter results for high-tech applications. Its discs or custom shapes offer versatility in design, while the controlled melting point and density promote consistent material behaviour during processing. The use of Indium as a binding metal further enhances the material properties, making it suitable for modern display, semiconductor, and sensor applications.

IGZO Sputtering Target Applications

- Display Technology: For the fabrication of thin-film transistors for modern displays.
- Semiconductor Devices: Ideal for depositing oxide layers in the production of integrated circuits.
- Sensor Applications: Used in the manufacturing of highly sensitive gas and chemical sensors.
- Optoelectronics: Employed in the creation of transparent conductive oxides for touch panels and solar cells.
- Research and Development: Serves as an essential material for experimental thin film studies and the fabrication of novel devices.

IGZO Sputtering Target Packing

Our IGZO sputtering targets are carefully packaged to maintain their pristine condition during storage and transport. Typically, the targets are vacuum sealed in protective packaging, with packaging options in various sizes available according to customer requirements.

Frequently Asked Questions

Q: What are the main applications of the IGZO sputtering target?
A: It is primarily used for the deposition of thin films for display technology, semiconductor devices, optoelectronics, and sensor manufacturing.

Q: How is the IGZO composition maintained during production?
A: The target is produced using precision-controlled processes to ensure that the exact stoichiometry of In2O3, Ga2O3, and ZnO is maintained for high-performance sputtering.

Q: Are custom shapes and sizes available for the IGZO sputtering target?
A: Yes, in addition to standard discs, the targets can be custom made to meet specific design and process requirements.

Q: What benefits does a high purity (≥99%) IGZO target provide?
A: A high purity ensures minimal contamination during sputtering, resulting in better uniformity, enhanced device performance, and higher quality thin films.

Q: Can the IGZO sputtering target be used in various sputtering systems?
A: Certainly; the target is compatible with a range of sputtering systems and thin film deposition technologies, making it versatile for various industrial applications.