ST0155 Indium Zinc Oxide (IZO) Sputtering Target

Indium-Zinc-Oxide (IZO) Sputtering Target Description

The Indium-Zinc-Oxide (IZO) sputtering target is engineered to provide exceptional performance in a variety of deposition processes. Made with a high-purity composition of In2O3/ZnO, this target delivers consistent and reliable results in both RF and DC sputtering systems for thin film applications. Its availability in custom forms, including discs or specifically designed shapes, meets the particular requirements of optoelectronics, display technology, and the semiconductor industry.

Indium-Zinc-Oxide (IZO) Sputtering Target Applications

- Thin Film Deposition: Ideal for producing high-quality transparent conductive coatings used in displays and touchscreens.
- Optoelectronics: Essential for manufacturing LED panels, flat screens, and smart devices.
- Semiconductor Devices: Provides excellent performance in creating energy-efficient electronic components.
- Photovoltaics: Enhances the efficiency and durability of solar cells through precise thin film application.
- Functional Coatings: Superior electrical and optical properties for creating precision instruments.

Indium-Zinc-Oxide (IZO) Sputtering Target Packing

Our Indium-Zinc-Oxide (IZO) sputtering target is securely packaged to maintain its high purity and performance. It is delivered in moisture-tight and static-controlled packaging to ensure optimal conditions during storage and transport. Custom packaging options are also available for specific requirements.

Frequently Asked Questions

Q: What is the typical application for the Indium-Zinc-Oxide (IZO) sputtering target?
A: It is commonly used for the deposition of thin films in optoelectronic devices, semiconductor components, and display technologies.

Q: Can the sputtering target be customised?
A: Yes, the target can be manufactured in custom shapes and sizes to meet specific application requirements.

Q: Which sputtering methods are compatible with this target?
A: The target is designed for both RF and DC sputtering procedures, ensuring versatile compatibility with various deposition systems.

Q: How is the sputtering target composed?
A: The target consists of a high-purity mixture of In2O3 and ZnO, ensuring exceptional performance with a purity of ≥99%.

Q: How is the target packaged to maintain its quality?
A: It is packaged in moisture-resistant and statically controlled containers, with options for further customisation to preserve quality during storage and transport.