ST0157 Black Iron Oxide (Fe3O4) Sputtering Target

Black Iron Oxide (Fe3O4) Sputtering Target Description

The Black Iron Oxide (Fe3O4) Sputtering Target is developed for high-performance sputtering processes, ensuring exceptional consistency and purity in thin film deposition. This precision-engineered target meets demanding industrial requirements and provides reliable performance in applications ranging from electronics manufacturing to sensor technology.

Black Iron Oxide (Fe3O4) Sputtering Target Applications

- Thin Film Deposition: Ideal for producing high-quality thin films used in electronic devices, sensors, and optical coatings.
- Microelectronics: Enables precise deposition processes critical for integrated circuits and semiconductor devices.
- Surface Modification: Utilised to alter surface characteristics for enhanced wear and corrosion resistance.
- Research and Development: Supports experimental setups requiring consistent, high-purity materials for innovative materials science studies.

Black Iron Oxide (Fe3O4) Sputtering Target Packing

Our Black Iron Oxide Sputtering Target is carefully packaged to preserve its quality and integrity.
- Standard Packaging: Vacuum-sealed containers to protect against contamination, available in quantities customised to customer needs.

Frequently Asked Questions

Q: What advantages does a purity level of ≥99% offer?
A: A high purity level ensures consistent sputtering performance, minimises contaminants in thin films, and increases the overall reliability of the material.

Q: Can the target be customised beyond the standard disc shape?
A: Yes, the Black Iron Oxide Sputtering Target is available both as a standard disc and in custom shapes to meet specific device or application requirements.

Q: For which applications is this sputtering target best suited?
A: It is particularly suitable for the deposition of thin films in electronics, microelectronics, sensor fabrication, and advanced surface modification processes.

Q: How does the melting point of the material affect its performance?
A: The melting point (~1597℃) indicates the target's ability to withstand high thermal loads during sputtering, ensuring stable performance even under challenging conditions.

Q: Are there specific handling or storage guidelines for the target?
A: Yes, proper storage in a controlled environment is recommended to avoid contamination and to maintain the physical and chemical properties of the target prior to use.