ST0158 Lanthanum Aluminate (LaAlO3) Sputtering Target

Lanthanaluminate (LaAlO3) Sputtering Target Description

The Lanthanaluminate (LaAlO3) sputtering target has been designed for excellent performance in thin film deposition. It is manufactured with high purity (≥99%) and precision and optimised for use in RF, RF-R, and DC sputtering processes. With a melting point of approximately 2080℃ and a density of around 6.52 g/cm³, this target provides consistent, reliable results in high-tech applications. Its outstanding material properties make it an ideal choice for semiconductor devices, optical coatings, and energy applications where high thermal stability and performance are essential.

Lanthanaluminate (LaAlO3) Sputtering Target Applications

- Thin Film Deposition: Ideal for the production of high-quality dielectric and insulating layers in the semiconductor and display industries.
- Advanced Electronics: Used in the manufacture of capacitors, sensors, and other electronic components that require precise layer uniformity.
- Optical Coatings: Suitable for the production of optical components with excellent transparency and resistance to optical impairments.
- Energy Applications: Applied in the development of energy-efficient devices and advanced energy storage systems.

Lanthanaluminate (LaAlO3) Sputtering Target Packaging

Our lanthanaluminate sputtering targets are produced and packaged with the utmost care to preserve their high purity and quality. The targets are available in standard discs or can be custom manufactured to meet specific industrial requirements. Each unit is securely packaged to ensure protection during storage and transport.

Frequently Asked Questions

Q: What are the main applications of the lanthanaluminate sputtering target?
A: It is primarily used for the deposition of thin films for electronics, optics, and energy devices where high thermal stability and purity are required.

Q: Which sputtering methods are compatible with this target?
A: The target is optimised for RF, RF-R, and DC sputtering processes.

Q: What is the purity level of the lanthanaluminate (LaAlO3) sputtering target?
A: The product is manufactured with a purity level of ≥99%.

Q: Can the target be manufactured in forms other than discs?
A: Yes, customised targets are available to fulfil specific application requirements.

Q: What are the key physical properties of this sputtering target?
A: It has a melting point of approximately 2080℃ and a density of around 6.52 g/cm³, ensuring excellent performance in high-temperature applications.