ST0165 Lanthanum Vanadium Oxide (LaVO3) Sputtering Target

Lanthanum Vanadium Oxide (LaVO3) Sputtering Target Description

The Lanthanum Vanadium Oxide (LaVO3) Sputtering Target is a premium material developed for advanced thin film deposition and surface coating applications. Manufactured with meticulous precision, this target ensures high structural integrity and stability, making it an ideal choice for high-performance industrial processes.

Constructed to meet stringent quality standards, the target offers consistent sputtering performance using RF, RF-R, and DC modes. Its high purity and customized fabrication options allow users to achieve superior film uniformity and enhanced product reliability in applications spanning semiconductor device fabrication, solar cells, and other cutting-edge technologies.

Lanthanum Vanadium Oxide (LaVO3) Sputtering Target Applications

· Thin Film Deposition: Facilitates the creation of uniform, high-quality thin films for advanced electronic devices.
· Semiconductor Fabrication: Ideal for producing precise components in semiconductor manufacturing.
· Surface Coatings: Enhances wear resistance and corrosion protection on industrial tools and machinery.
· Research and Development: Supports advanced R&D efforts in materials science and applied physics.

Lanthanum Vanadium Oxide (LaVO3) Sputtering Target Packing

Our sputtering targets are packaged under controlled conditions to preserve product integrity. Each target is carefully vacuum-sealed and available in custom sizes to meet specific application requirements.

Frequently Asked Questions

Q: What sputtering modes are supported by this target?
A: The target supports RF, RF-R, and DC sputtering, offering versatility for various deposition techniques.

Q: Can this target be custom-made according to specific requirements?
A: Yes, the target is available in custom-made shapes and sizes to suit specialized application needs.

Q: What applications is the Lanthanum Vanadium Oxide Sputtering Target best suited for?
A: It is ideal for thin film deposition in semiconductor fabrication, surface coatings, and advanced R&D in materials science.

Q: How does the high purity of the target benefit the sputtering process?
A: High purity (≥99%) ensures consistent film quality, improved deposition efficiency, and minimized contamination during processing.

Q: What measures are taken during packaging to maintain the target's quality?
A: The targets are vacuum-sealed and handled under controlled conditions to maintain their integrity and performance from production to end use.