Discontinued (Discontinued) ST0169 Lead Lanthanum Zirconium Titanate Sputtering Target

Lead-Lanthanum-Zirconium-Titanate Sputtering Target Description

The Lead-Lanthanum-Zirconium-Titanate Sputtering Target has been developed using advanced ceramic processing methods to achieve excellent performance in thin film deposition. With a composition optimised for high purity and stability, this target is ideal for the manufacture of capacitors, sensors, piezoelectric transducers, and memory devices. Its consistent quality ensures reliable performance even under the stringent operating conditions in the high-tech industry.

Lead-Lanthanum-Zirconium-Titanate Sputtering Target Applications

- Thin Film Deposition: Essential for the production of microelectronic components such as capacitors, sensors, and transducers.
- Ferroelectric Components: Widely used in non-volatile memory devices and piezoelectric applications.
- Surface Coatings: Applicable in semiconductor manufacturing for producing high-quality, uniform films.
- Research and Development: Preferred in academic and industrial research for exploring advanced material properties.

Lead-Lanthanum-Zirconium-Titanate Sputtering Target Packaging

Our Lead-Lanthanum-Zirconium-Titanate Sputtering Targets are packaged to maintain their high purity and performance.
Vacuum-sealed packaging: Available in 5 kg per bag or 25 kg per drum to ensure safe and contamination-free transport.

Frequently Asked Questions

Q: What is the main application of the Lead-Lanthanum-Zirconium-Titanate Sputtering Target?
A: It is primarily used in thin film deposition processes for the manufacture of microelectronic components, ferroelectric devices, and advanced sensor applications.

Q: How does the high purity (≥99%) of the target affect its performance?
A: The high level of purity ensures optimal electrical and mechanical properties, thereby enhancing reliability and performance in high-precision thin film and microelectronic applications.

Q: Are there custom shapes and sizes available for this sputtering target?
A: Yes, the product is available in standard disc shapes or can be customised to meet specific requirements.

Q: In which industries is this sputtering target typically used?
A: It is frequently employed in the semiconductor industry, microelectronics, and research, as well as in applications requiring advanced ferroelectric materials.

Q: What should be considered during the sputtering process with this target?
A: Users should consider the high thermal stability of the target and adjust the sputter parameters accordingly to ensure optimal film quality and efficient material utilisation.