ST0172 Lithium Niobate (LiNbO₃) Sputtering Target

Lithium Niobate (LiNbO₃) Sputtering Target Description

The Lithium Niobate (LiNbO₃) sputtering target has been developed for high-performance applications in thin film deposition. It is manufactured with high precision, possesses a high purity level (≥99%), and can be produced in discs or custom shapes to meet specific application requirements. With a melting point of 1253℃ and a density of 4.64 g/cm³, this target exhibits excellent thermal stability during RF and RF-R sputtering processes. Its reliable performance makes it suitable for critical applications in the fields of electronics, photonics, and the manufacture of optical devices.

Lithium Niobate (LiNbO₃) Sputtering Target Applications

- Optical Devices: Essential for the manufacture of modulators, waveguides, and other optical components.
- Telecommunications: Used in devices requiring precise frequency conversion and high-speed signal processing.
- Piezoelectric Devices: Due to the unique electromechanical properties of lithium niobate, it is a crucial component in sensors and actuators.
- Nonlinear Optical Applications: Suitable for acousto-optic modulators and devices that utilise nonlinear optical properties.
- Research and Development: Frequently employed in scientific research for experimental thin film depositions and materials science studies.

Lithium Niobate (LiNbO₃) Sputtering Target Packing

Our lithium niobate sputtering targets are carefully packaged to ensure optimal preservation and protection during storage and transport. The products are delivered in vacuum-sealed containers with individual weight and size options to meet different customer specifications.

Frequently Asked Questions

Q: What are the primary applications of the lithium niobate sputtering target?
A: It is primarily used in thin film deposition processes for the manufacture of optical devices, telecommunications components, piezoelectric sensors, and other high-tech applications.

Q: Which sputtering methods can be used with this target?
A: The target is suitable for both RF and RF-R sputtering methods, thereby providing flexibility for various deposition techniques.

Q: How does a purity level of ≥99% affect performance?
A: A high purity level minimises impurities and defects, ensuring consistent and reliable performance in demanding industrial applications.

Q: Are custom sizes and shapes available for specific application requirements?
A: Yes, the targets can be manufactured in various forms, including discs, to meet the precise requirements of your project.

Q: What advantages does the high melting point of 1253℃ provide?
A: The high melting point ensures excellent thermal stability during sputtering and prevents the decomposition of the target material under high energy conditions.