ST0173 Lithium Phosphate (Li3PO4) Sputtering Target

Lithium Phosphate (Li3PO4) Sputtering Target Description

The Lithium Phosphate (Li3PO4) Sputtering Target is engineered for demanding sputtering applications in the electronics and semiconductor industries. Manufactured with high purity (≥99%) and precision, this target is available as discs or custom-made to meet specific project requirements. Its well-defined melting point (~837℃) and density (2.53 g/cm³) ensure stable performance under various sputtering conditions, including RF, RF-R, and DC methods. The incorporation of specialized bonding types such as Indium and Elastomer enhances its adaptability for diverse experimental setups and industrial scale-up processes.

Lithium Phosphate (Li3PO4) Sputtering Target Applications

· Thin Film Deposition: Ideal for producing uniform thin films in display panels, solar cells, and semiconductor devices.
· Microelectronics: Utilized in advanced circuit manufacturing for high precision sputtering processes.
· Surface Coatings: Applied in coating processes for corrosion protection and improved wear resistance in industrial components.
· Research and Development: Employed in laboratories for developing innovative sputtering techniques and material studies.

Lithium Phosphate (Li3PO4) Sputtering Target Packing

Our Lithium Phosphate Sputtering Targets are packaged with utmost care to maintain their pristine condition during storage and transportation. Custom packaging solutions are available to suit specific size and weight requirements, ensuring that the product arrives securely and is ready for immediate use in your sputtering applications.

Frequently Asked Questions

Q: What makes Lithium Phosphate (Li3PO4) an ideal material for sputtering targets?
A: Its high purity (≥99%) and well-defined melting point provide stable and reliable performance in various sputtering methods, making it highly efficient for forming uniform thin films.

Q: Which sputtering methods are supported by this target?
A: The target is compatible with RF, RF-R, and DC sputtering processes, offering versatility across different industrial applications.

Q: How are custom shapes and sizes managed for this product?
A: The product is available in discs or can be custom-made to the specifications required, providing tailored solutions for specific fabrication needs.

Q: What type of bonding is used in this sputtering target?
A: The target utilizes Indium and Elastomer bonding, which ensures strong adhesion and optimal performance during the sputtering process.

Q: How is the quality of the Lithium Phosphate (Li3PO4) Sputtering Target maintained during packaging?
A: Our products are securely packaged using custom solutions designed to prevent any physical or atmospheric damage, thus preserving the target’s quality from production to application.