ST0178 Neodymium Oxide (Nd2O3) Sputtering Target

Neodymium Oxide (Nd2O3) Sputtering Target Description

The Neodymium oxide (Nd₂O₃) sputtering target is manufactured with a minimum purity of 99% and is designed for optimum performance in advanced industrial applications. This target utilises state-of-the-art manufacturing techniques and provides reliable sputtering properties through RF, RF-R, and DC methods. Its high melting point and unique bonding options ensure excellent stability and durability, making it an ideal choice for the manufacturing of microelectronic devices, thin film deposition, and surface technology.

Neodymium Oxide (Nd2O3) Sputtering Target Applications

- Manufacturing of integrated circuits: Facilitates the deposition of high-quality Nd₂O₃ layers in modern microelectronic circuits.
- Thin film coatings: Widely used for the production of decorative, protective, and optical coatings.
- Optical devices: Suitable for the manufacture of high-performance optical components and laser systems.
- Scientific research: Employed in advanced materials research and experimental sputtering facilities.

Neodymium Oxide (Nd2O3) Sputtering Target Packing

Our Neodymium oxide (Nd₂O₃) sputtering target is packaged with utmost care to maintain its high purity and performance.
The vacuum-sealed packaging is available with customizable options to meet specific customer and application requirements.

Frequently Asked Questions

Q: Which sputtering methods are compatible with this target?
A: The target supports RF, RF-R, and DC sputtering processes.

Q: What are the main applications of the Nd₂O₃ sputtering target?
A: It is commonly used in microelectronics, thin film coatings, optical devices, and scientific research.

Q: How is the high purity of the target ensured?
A: Advanced manufacturing processes and stringent quality controls ensure a purity level of ≥99%.

Q: Can the target be customised in shape and size?
A: Yes, the targets can be delivered as discs or tailored to specific requirements.

Q: Why is a high melting point important for this sputtering target?
A: The high melting point of 2233°C ensures improved stability and durability for high-temperature sputtering applications.