ST0194 Tin Oxide (SnO2) Sputtering Target

Tin Oxide (SnO2) Sputtering Target Description

The Tin Oxide (SnO2) sputtering target is designed for high-performance applications in thin film deposition. Manufactured with a purity of ≥99%, the target ensures uniform sputtering during both RF and RF-R methods, making it suitable for applications that require precision and consistency. Its properties include a high melting point of 1630℃ and a density of 6.95 g/cm³, which makes it appropriate for advanced applications in electronic components, optical coatings, and sensor technologies.

Applications of Tin Oxide (SnO2) Sputtering Target

- Thin Film Deposition: Ensures consistent, high-quality layer formation in semiconductor manufacturing and optical coating processes.
- Electronics Manufacturing: Widely used in the production of conductive and transparent oxide layers for displays and photovoltaic devices.
- Sensor Manufacturing: Provides reliable performance in gas sensors and other chemical sensor applications.
- Research and Development: Ideal for academic and industrial research that requires high-purity sputtering targets.

Tin Oxide (SnO2) Sputtering Target Packaging

Our Tin Oxide (SnO2) sputtering targets are securely packaged to maintain product integrity during storage and transport. Custom orders are available to meet specific industrial requirements, ensuring that the targets arrive in optimal condition for immediate use.

Frequently Asked Questions

Q: What are the main applications of Tin Oxide (SnO2) sputtering targets?
A: They are primarily used in thin film deposition processes, including electronics, optical coatings, and sensor manufacturing.

Q: Which sputtering methods are compatible with this target?
A: This target is optimised for use with RF and RF-R sputtering techniques.

Q: How does the purity of the target affect its performance?
A: A purity level of ≥99% ensures consistent sputtering results and minimises impurities that could compromise the quality and performance of the layers.

Q: Can the target be customised for different manufacturing requirements?
A: Yes, the Tin Oxide (SnO2) sputtering target is available in standard disc forms or can be tailored to meet specific application requirements.

Q: Which industries benefit the most from using Tin Oxide (SnO2) sputtering targets?
A: Industries such as electronics, photovoltaics, sensors, and research laboratories benefit from the high precision and quality of these targets.