ST0196 Titanium Pentoxide (Ti3O5) Sputtering Target

Titanium Pentoxide (Ti3O5) Sputtering Target Description

The Titanium Pentoxide (Ti3O5) Sputtering Target is a high-performance material designed for precise industrial applications. Manufactured under strict quality controls, the target achieves a purity of ≥99% and is available in standard disc forms as well as custom configurations. It is engineered to provide consistent performance in advanced deposition processes, ensuring excellent adhesion and surface quality. This material is suitable for vacuum coating, semiconductor manufacturing, and a range of surface modification applications where durability and reliability are essential.

Titanium Pentoxide (Ti3O5) Sputtering Target Applications

- Vacuum Coating: Ideal for the deposition of thin films in optical, electronic, and decorative applications.
- Semiconductor Manufacturing: Enables precise material deposition for microelectronic components.
- Surface Modification: For the production of durable coatings and functional surfaces in various industrial tools.
- Research and Development: Provides a high-purity target for experimental and prototypical applications in modern materials science.

Titanium Pentoxide (Ti3O5) Sputtering Target Packaging

Our Titanium Pentoxide Sputtering Target is carefully packaged to maintain its high purity and performance. The packaging is customised according to customer requirements and typically includes secure, moisture-controlled conditions, ensuring that the target remains in optimal condition during storage and transport.

Frequently Asked Questions

Q: Which industries benefit the most from using the Titanium Pentoxide (Ti3O5) Sputtering Target?
A: Industries such as semiconductor manufacturing, optics, and advanced surface coating are the primary beneficiaries of this high-purity sputtering target.

Q: Can the shape of the sputtering target be customised?
A: Yes, in addition to the standard disc shape, custom shapes are available to meet specific application requirements.

Q: What is the significance of the high melting point of the Titanium Pentoxide Sputtering Target?
A: The high melting point (~1800-1900℃) ensures that the target can withstand high-temperature processes without degradation, which is critical for reliable sputtering performance.

Q: How does a purity level of ≥99% affect the performance of the sputtering target?
A: A purity level of ≥99% ensures minimal impurities, leading to consistent sputtering behaviour and high-quality thin films or coatings in industrial applications.

Q: What precautions are taken during packaging to ensure the quality of the sputtering target?
A: The targets are packaged under moisture-controlled, secure conditions, with tailored packaging solutions provided to protect the material during storage and transport.