Discontinued (Discontinued) ST0207 Zirconia Stabilized with Yttria (ZrO2/Y2O3) Sputtering Target

Zirconia Stabilized with Yttria (ZrO2/Y2O3) Sputtering Target Description

Our Zirconia Stabilized with Yttria (ZrO₂/Y₂O₃) Sputtering Target is designed for high-efficiency sputtering processes in precision-driven industrial applications. Manufactured under stringent quality control, this target offers exceptional stability and performance even under high-temperature conditions. The integration of yttria into zirconia enhances its thermal stability and durability, ensuring an extended operational lifespan. Ideal for applications demanding uniform and reliable material deposition, this product meets the evolving needs of semiconductor fabrication, advanced coatings, and material research.

Zirconia Stabilized with Yttria (ZrO2/Y2O3) Sputtering Target Applications

·         Semiconductor Fabrication: Critical for depositing uniform thin films.

·         Advanced Coatings: Provides enhanced durability for wear-resistant and thermally stable coatings.

·         Research and Development: Suitable for high-temperature and precise deposition studies.

·         Industrial Sputtering Processes: Ensures reliable performance in large-scale production environments.

Zirconia Stabilized with Yttria (ZrO2/Y2O3) Sputtering Target Packing

Our sputtering targets are meticulously packaged to guarantee quality preservation during storage and transit.
- Packaging: Vacuum-sealed to maintain product integrity.
- Custom Sizes: Available in customized formats to suit specific application requirements.

Frequently Asked Questions

Q: What makes the Zirconia Stabilized with Yttria sputtering target ideal for high-temperature applications?
A: The integration of yttria into zirconia stabilizes the structure, enhancing its thermal stability and enabling it to maintain performance under extreme conditions.

Q: How is the purity of the target ensured?
A: The manufacturing process is conducted under strict quality control measures to achieve a purity level of ≥99%, ensuring optimal performance in critical applications.

Q: Can the shape of the sputtering target be customized?
A: Yes, the target is available in standard disc form or can be custom-made to meet specific design and application requirements.

Q: Which industries benefit the most from this sputtering target?
A: Industries such as semiconductor fabrication, advanced coating technologies, and high-temperature material research benefit significantly from this product.

Q: What advantage does the zirconia-ytria composite offer compared to pure zirconia?
A: The addition of yttria not only stabilizes the zirconia structure but also improves its resistance to thermal shock and enhances durability, making it more reliable during intensive sputtering processes.