Discontinued (Discontinued) ST0209 Boron Nitride (BN) Sputtering Target

BN Sputtering Target Description

The BN Sputtering Target is produced with a focus on high purity and exceptional performance. Its excellent thermal stability, high melting point, and customised bonding options make it a reliable choice for critical thin film deposition processes. The use of advanced manufacturing techniques ensures that our target provides consistent sputtering performance and optimal film quality in demanding environments.

BN Sputtering Target Applications

- Thin film deposition: Ideal for the production of high-quality thin films in semiconductors and optical devices.
- Manufacturing of microelectronic components: Supports deposition processes for insulating and buffer layers in microelectronics.
- Modern coatings: Utilised for protective coatings requiring high thermal stability.
- Research and development: An excellent material for experimental studies in materials science and surface engineering.
- Custom industrial applications: Tailored for specific requirements in various high-performance industries.

BN Sputtering Target Packaging

Our BN Sputtering Target is carefully packaged to ensure its integrity during storage and transport. Standard packaging options include vacuum-sealed configurations for discs or bespoke shapes according to customer specifications. Special packaging can be arranged for larger batch orders to ensure that product quality is not compromised.

Frequently Asked Questions

Q: What are the main applications of the BN Sputtering Target?
A: It is primarily used for thin film deposition in the manufacture of semiconductors, optical, and electronic devices.

Q: Which sputtering methods are compatible with this target?
A: The target is compatible with both RF and RF-R sputtering processes.

Q: What benefits does the high purity (≥99%) of the target provide for the deposition process?
A: The high purity ensures minimal contamination, leading to excellent film quality and reliability in end applications.

Q: Can the target be customised in shape and size?
A: Yes, the target is available in standard disc shapes or can be custom manufactured for specific requirements.

Q: What advantages does the high melting point (~2973℃) offer?
A: The high melting point ensures thermal stability during the sputtering process, making it ideal for high-temperature applications.