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ST0209 Boron Nitride (BN) Sputtering Target

Catalogue Number ST0209
Composition BN
CAS Number 10043-11-5
Purity ≥99% (99.5% / 99.9% available)
Shape Discs, or Custom-made
Synonyms Boron Nitride Sputtering Target, BN Target, Hexagonal Boron Nitride Target, h-BN Target

Stanford Advanced Materials (SAM) offers high-purity Boron Nitride (BN) Sputtering Targets (≥99%) engineered for advanced thin film deposition processes. Boron nitride is a unique ceramic material that combines high thermal conductivity with excellent electrical insulation, making it ideal for semiconductor, microelectronic, and optical coating applications. Our BN targets are manufactured via hot press sintering and precision machining to achieve high density (>1.9 g/cm³) and fine, uniform grain structure, ensuring consistent RF sputtering performance and minimal particle generation. Available in standard disc geometries or custom configurations to meet specific system requirements.

Related Products: Aluminum Nitride (AlN) Sputtering Target | Silicon Nitride (Si3N4) Sputtering Target | Boron Carbide (B4C) Sputtering Target

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FAQ

Q: What sputtering method works best for Boron Nitride targets?

A: BN is an electrical insulator, so you need RF or RF-Reactive (RF-R) sputtering. DC will not work—charge accumulates on the target surface and you will encounter arcing or the plasma will extinguish.

 

Q: Why is density important for BN targets?

A: BN is inherently soft and may be porous if not processed correctly. Low density results in more particles during sputtering and fluctuating film quality. We apply hot pressing to achieve a density of >1.9 g/cm³, which corresponds to approximately 90%+ of the theoretical—this is the optimal point for mechanical stability and sputtering performance.

 

Q: Do BN targets need bonding to a backing plate?

A: Generally yes, especially if you are operating at any reasonable power. BN is brittle and thermal shock may cause it to crack if it is not properly bonded to a cooled backing plate. We offer indium and elastomer bonding—please provide your power range and we will recommend what is suitable.

Q: What's the difference between hexagonal BN (h-BN) and other forms?

A: h-BN is the soft, lubricious form (with a structure akin to graphite) and is what most sputtering targets utilise. There is also cubic BN (c-BN), which is extremely hard (like diamond), but that is not typically used for sputtering targets. Our targets are h-BN with random grain orientation for consistent sputtering.

Q: What's the lead time for a custom BN target?

A: Standard discs (2"-6") usually ship within 1-2 weeks. Custom shapes take 3-4 weeks depending on complexity. If you require expedited service, please inform us—sometimes we can expedite this process.

Q: Can BN targets be used for high-temperature applications?

A: Yes, that is one of BN's strengths. It sublimes around 2,973°C, so it remains stable at temperatures that would destroy most other materials. Just ensure that your bonding can tolerate the heat—indium melts at around 157°C, so for very high-temperature applications, you may prefer mechanical clamping instead.

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
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    Bonding

    Yes

    • Yes
    • No
    • Other
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