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  • ST0211 Germanium Nitride (Ge3N4) Sputtering Target

    • ST0211 Germanium Nitride (Ge3N4) Sputtering Target

    Catalogue Number ST0211
    Composition Ge₃N₄
    CAS Number 12065-36-0
    Purity ≥99%
    Shape Discs, or Custom-made

    At Stanford Advanced Materials, we focus on developing innovative sputtering target solutions specifically tailored for high-performance industrial applications. Our expertise and commitment to quality ensure that each product consistently meets the stringent standards required by today's advanced technologies.

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    Neodymium (Nd) Sputtering Target
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    Niobium (Nb) Sputtering Target
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    ST0036 Praseodymium (Pr) Sputtering Target
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    NB0036 Niobium target disc, Nb target disc
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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
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      Bonding

      Yes

      • Yes
      • No
      • Other
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