ST0219 Zinc Nitride (Zn3N2) Sputtering Target

Zinc Nitride (Zn3N2) Sputtering Target Description

The Zinc Nitride (Zn₃N₂) Sputtering Target is engineered to deliver consistent and reliable performance in sputtering deposition processes. Manufactured with a purity of ≥99%, this target ensures stable thin-film formation and precise patterning for advanced industrial applications. With customizable shapes available, it is suitable for specialized sputtering equipment and research applications.

Zinc Nitride (Zn3N2) Sputtering Target Applications

· Semiconductor Devices: Integral for deposition processes in microelectronics and integrated circuits.
· Optoelectronic Devices: Utilized in the fabrication of LEDs, photodetectors, and related components.
· Surface Coatings: Applied in thin-film coating technologies for enhanced wear resistance and performance.
· Advanced Research: Ideal for experimental sputtering setups and material science studies.

Zinc Nitride (Zn3N2) Sputtering Target Packing

Our Zinc Nitride Sputtering Targets are securely packaged to maintain product integrity during shipping and storage. Packaging options include vacuum-sealed methods with customizable weights and configurations to suit industry-specific requirements.

Frequently Asked Questions

Q: What are the common applications of Zinc Nitride Sputtering Targets?
A: They are primarily used in semiconductor device fabrication, optoelectronic components, surface coating processes, and advanced research applications.

Q: How does a purity level of ≥99% affect performance?
A: The high purity ensures minimal contamination during sputtering, which leads to superior film quality, enhanced consistency, and improved electrical properties.

Q: Are custom shapes available for the sputtering targets?
A: Yes, our targets can be fabricated as discs or in custom-made shapes to meet specific equipment and application requirements.

Q: How stable is Zn₃N₂ under high-temperature sputtering conditions?
A: With a melting point of ~700℃ and robust chemical stability, Zn₃N₂ demonstrates excellent performance under high-temperature conditions typical in sputtering processes.

Q: What special handling or storage is required for these targets?
A: It is recommended to store the targets in a clean, dry environment and handle them with care to preserve their high purity and structural integrity during installation and operation.