Discontinued (Discontinued) ST0255 Titanium Fluoride (TiF3) Sputtering Target

Titanium Fluoride (TiF3) Sputtering Target Description

The Titanium Fluoride (TiF3) Sputtering Target is a high-performance material developed for precision thin film deposition. Manufactured using advanced processing techniques, it boasts a purity of ≥99% and offers customizable shapes to meet diverse industrial requirements. Its excellent thermal stability and high melting point make it suitable for use in semiconductor fabrication, optical coatings, and other high-tech applications, ensuring both durability and consistent performance under rigorous conditions.

Titanium Fluoride (TiF3) Sputtering Target Applications

· Semiconductor Industry: Ideal for depositing thin films in integrated circuits and other semiconductor components.
· Optical Coatings: Used in the production of high-quality optical devices and lenses.
· Solar Cells: Enhances the efficiency of photovoltaic cells through precise thin film deposition.
· Display Technology: Essential in the manufacturing of advanced display panels.
· Research and Development: Useful in experimental setups where high-purity sputtering targets are required.

Titanium Fluoride (TiF3) Sputtering Target Packing

Our Titanium Fluoride (TiF3) Sputtering Target is carefully packaged to maintain its high quality and purity. It is delivered using vacuum-sealed packaging to protect against contamination and ensure product stability during storage and transportation. Custom packaging options are available upon request.

Frequently Asked Questions

Q: What is Titanium Fluoride (TiF3) Sputtering Target used for?
A: It is primarily used in sputtering processes for thin film deposition in semiconductor, optical, and display manufacturing industries.

Q: How is the Titanium Fluoride (TiF3) Sputtering Target manufactured?
A: It is produced using advanced fabrication techniques that guarantee a purity of ≥99% and robust thermal stability.

Q: Can the size of the Titanium Fluoride (TiF3) Sputtering Target be customized?
A: Yes, the available sizes are fully customizable to meet specific application requirements.

Q: What are the key thermal properties of this sputtering target?
A: It features a high melting point of 1130℃ and a density of 3.13 g/cm³, making it ideal for high-temperature applications.

Q: Are there specific handling or safety procedures for this product?
A: Standard safety protocols must be followed, including the use of appropriate personal protective equipment and adherence to material safety data guidelines.