ST0260 Chromium Silicide (CrSi₂) Sputtering Target

Chromium Silicide (CrSi₂) Sputtering Target Description

The Chromium Silicide (CrSi₂) sputtering target has been developed for high performance in a range of advanced industrial sputtering applications. It is manufactured under stringent quality controls to ensure excellent uniformity in deposition, stability under high-performance plasma conditions, and excellent adhesion properties on various substrates. Its unique composition and meticulous manufacturing process make it suitable for semiconductor manufacturing, microelectronic device production, and surface coating applications. The high purity and consistent performance of the target demonstrate advanced production techniques and rigorous quality assurance protocols.

Chromium Silicide (CrSi₂) Sputtering Target Applications

- Thin film deposition: Ideal for depositing high-quality conductive layers in semiconductor fabrication.
- Microelectronics: Provides reliable performance in the manufacture of printed circuit boards and the coating of electronic components.
- Solar cells: Utilised in the production of highly efficient solar cells.
- Optoelectronics: Suitable for devices such as LEDs and photodetectors.
- Research and development: Excellent for experimental setups in materials science laboratories.

Chromium Silicide (CrSi₂) Sputtering Target Packing

Our Chromium Silicide sputtering targets are packaged with the utmost care to maintain product integrity during storage and transport. Custom packaging options are available, typically supplied in vacuum-sealed containers in accordance with order specifications.

Frequently Asked Questions

Q: Which sputtering method is recommended for the Chromium Silicide (CrSi₂) sputtering target?
A: This target is optimised for RF sputtering, which enables efficient and uniform thin film deposition.

Q: Can I receive the target in a custom shape?
A: Yes, the product is available in a standard disc shape or can be fabricated according to your specific application requirements.

Q: What does the purity level (≥99%) for this sputtering target indicate?
A: A purity level of ≥99% ensures minimal impurities, resulting in high-quality layer deposition and enhanced performance in sputtering processes.

Q: Which industries benefit most from using this sputtering target?
A: Industries such as semiconductor manufacturing, microelectronics, solar cell production, and advanced materials research find this target extremely advantageous.

Q: Are there specific guidelines for handling this product?
A: Yes, proper handling and installation, including the use of compatible adhesion promoters such as Indium or elastomer, are essential for optimal performance. Detailed instructions are provided in the product documentation.