ST0263 Magnesium Silicide (Mg2Si) Sputtering Target

Magnesium-Silicid (Mg2Si) Sputtering Target Description

The Magnesium-Silicide (Mg2Si) sputtering target is a high-quality, high-purity material designed for advanced sputtering applications. With a composition of Mg₂Si and a minimum purity level of 99%, this target is engineered for consistent performance across various sputtering techniques, including RF, RF-R, and DC sputtering. Its controlled melting point and density ensure precise deposition and a uniform film, making it suitable for semiconductor fabrication and thin-film technology. Customisable shapes allow for tailored applications and ensure compatibility with specific equipment and process requirements.

Magnesium-Silicid (Mg2Si) Sputtering Target Applications

- Thin-film deposition: Essential for producing high-quality thin films in semiconductor and microelectronic devices.
- Semiconductor fabrication: Provides reliable performance necessary for modern integrated circuit production.
- Surface coatings: Ideal for thermal spraying and laser cladding, offering enhanced wear and corrosion resistance.
- Advanced research: Suitable for R&D environments where precision materials are critical for exploring new coating techniques.

Magnesium-Silicid (Mg2Si) Sputtering Target Packing

Our Magnesium-Silicide sputtering targets are packed with utmost care to maintain product integrity. Each target is securely housed in anti-static, moisture-resistant, custom containers to ensure safe transport and storage. Packaging options can be tailored to specific order sizes and delivery requirements.

Frequently Asked Questions

Q: In which industries is the Magnesium-Silicide (Mg2Si) sputtering target commonly used?
A: It is frequently employed in semiconductor manufacturing, thin-film deposition, surface coating processes, and various advanced research applications.

Q: Which sputtering methods are compatible with this target?
A: The target is compatible with RF, RF-R, and DC sputtering methods, making it versatile for different deposition systems.

Q: How is product purity maintained during production?
A: Our targets are manufactured under stringent quality control procedures to ensure a minimum purity level of 99%, essential for high-performance applications.

Q: Are custom shapes available for specific equipment?
A: Yes, in addition to standard discs, custom shapes are available that accommodate specific device configurations and application requirements.

Q: What measures are taken to ensure safe packaging and transport?
A: Each disc is securely packaged in anti-static, moisture-resistant containers, with packaging options tailored to maintain product integrity during storage and transport.