ST0275 Calcium Sulfide (CaS) Sputtering Target

Calcium Sulfide (CaS) Sputtering Target Description

The Calcium Sulfide (CaS) Sputtering Target is manufactured to stringent quality standards with a composition of pure CaS (≥99%). This target is designed for precise and efficient sputtering deposition, ensuring consistency and stability in high-temperature processing environments. Its physical characteristics and customizable forms make it suitable for applications ranging from the production of electronic devices to optical coatings and research in modern materials science.

Calcium Sulfide (CaS) Sputtering Target Applications

- Thin Film Deposition: Utilised in the production of high-quality thin films for semiconductors and optoelectronic devices.
- Manufacture of Electronic Devices: Employed in sputtering processes to produce uniform layers in integrated circuits and sensors.
- Optical Coatings: Provides a reliable material for coating processes used in the fabrication of mirrors, lenses, and other optical components.
- Research and Development: Ideal for laboratories and industrial R&D projects focusing on novel material applications and coatings.

Calcium Sulfide (CaS) Sputtering Target Packing

The Calcium Sulfide (CaS) Sputtering Target is securely packaged to maintain its purity and performance. Protective packaging methods include vacuum-sealed containers and custom packaging solutions tailored to the customer’s requirements. Standard packaging is available in sizes that can be adapted based on application and quantity needs.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a solid material used in Physical Vapor Deposition (PVD) processes to apply thin layers onto substrates through a sputtering mechanism.

Q: Which applications benefit most from the use of a CaS sputtering target?
A: Applications in electronics, optical coatings, and advanced research particularly benefit from the high purity and stable performance of CaS sputtering targets.

Q: Are custom shapes available for this target?
A: Yes, the Calcium Sulfide (CaS) Sputtering Target is available as a disc or as a custom fabrication for specific customer requirements.

Q: How does the high melting point of CaS affect its performance in sputtering processes?
A: The high melting point of 2525 °C ensures that the target retains its structural integrity and performance during high-temperature sputtering processes.

Q: What measures are taken to ensure the purity and consistency of the CaS sputtering target?
A: The target is produced under strict quality control measures that ensure a purity of ≥99%, guaranteeing consistent performance and reliability in demanding applications.