ST0276 Chromium Sulfide (Cr2S3) Sputtering Target

Chromium Sulphide (Cr2S3) Sputtering Target Description

The Chromium Sulphide (Cr2S3) sputtering target has been developed to meet the stringent requirements of modern thin film deposition processes. Manufactured with a purity of ≥99%, this target ensures an extremely consistent material composition, making it ideal for precise coating applications. Its customisable shapes and sizes allow for tailored solutions in various industrial contexts, ensuring optimal performance across a wide range of applications. The unique chemical properties and high density of Cr₂S₃ facilitate uniform deposition, making this product a reliable choice for advanced semiconductor devices, solar cells, and sensor technologies.

Chromium Sulphide (Cr2S3) Sputtering Target Applications

- Thin film deposition: Essential for semiconductor manufacturing and advanced coating processes.
- Photovoltaic devices: Used in the development of thin film solar cells.
- Sensor manufacturing: Provides high-quality layers for efficient sensor performance.
- Protective coatings: Employed for corrosion resistance and durability of industrial components.

Chromium Sulphide (Cr2S3) Sputtering Target Packing

Our Chromium Sulphide (Cr2S3) sputtering targets are packaged with the utmost care to maintain product integrity during storage and transport. They are available in custom sizes and configurations. Standard packaging options include moisture-resistant, sealed containers designed to preserve the high quality of the sputtering target throughout its entire lifecycle.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material source used in physical vapour deposition processes for the deposition of thin films on substrates.

Q: Which industries benefit from using chromium sulphide sputtering targets?
A: They are commonly employed in electronics, photovoltaics, sensor manufacturing, and other sectors requiring precise thin film deposition.

Q: How is the purity of the sputtering target maintained?
A: The target is produced under strict quality control procedures to ensure a purity of ≥99%, which is crucial for consistent performance.

Q: Are the shapes of the sputtering targets fixed?
A: No, standard shapes include discs, but targets can also be custom-made to meet specific application requirements.

Q: What makes chromium sulphide (Cr2S3) ideal for thin film deposition?
A: Its excellent chemical stability, high density, and exceptional purity enable the formation of uniform, high-quality thin films that are essential for modern coating applications.