ST0278 Germanium Sulfide (GeS) Sputtering Target

Germanium Sulfide (GeS) Sputtering Target Description

The Germanium Sulfide (GeS) Sputtering Target is produced with high purity GeS (≥99%) and precision engineering to meet the rigorous demands of modern thin film deposition processes. Designed for the semiconductor and electronic industries, this sputtering target provides consistent performance with a melting point of 940℃ and a density of 4.08 g/cm³. Its customizable shapes, available as discs or bespoke designs, ensure compatibility with a wide range of deposition systems. This product is ideal for applications requiring reliable and uniform film production under high-temperature conditions.

Germanium Sulfide (GeS) Sputtering Target Applications

· Semiconductor Manufacturing: Essential for fabricating integrated circuits and electronic components with precise thin film characteristics.
· Photovoltaic Devices: Used in the deposition process to produce high-efficiency solar cells.
· Thin Film Deposition: Provides excellent uniformity in coatings for sensors, optoelectronic devices, and protective layers.
· Surface Engineering: Enables advanced surface modifications for improved wear resistance and functional coatings.
· Research and Development: Supports experimental and pilot production in material science laboratories.

Germanium Sulfide (GeS) Sputtering Target Packing

Our Germanium Sulfide (GeS) Sputtering Targets are packaged with care to ensure they maintain their integrity during transit and storage.
· Standard Packaging: Vacuum-sealed discs or custom-designed packaging based on client requirements.
· Available in: Custom sizes as per specific customer specifications to ensure optimal compatibility with deposition equipment.

Frequently Asked Questions

Q: What industries typically use germanium sulfide sputtering targets?
A: They are primarily used in semiconductor manufacturing, photovoltaic device production, and advanced thin film deposition applications in electronics and surface engineering.

Q: How does the high purity (≥99%) of GeS affect its performance?
A: The high purity ensures consistent film deposition, minimizes contamination during processing, and contributes to enhanced material performance in critical applications.

Q: Can I request a custom shape for the sputtering target?
A: Yes, the product is available in discs or can be custom-made to fit specific deposition system requirements.

Q: What factors should be considered when integrating the GeS sputtering target into a deposition system?
A: Key considerations include the target’s melting point, density, and the compatibility of the target shape with the deposition equipment’s design.

Q: Are there special handling or storage requirements for the GeS sputtering target?
A: It is recommended to store the target in a clean, dry, and temperature-controlled environment. Vacuum-sealed packaging helps maintain its high purity and prevents contamination.