ST0281 Lead Sulfide (PbS) Sputtering Target

Lead Sulfide (PbS) Sputtering Target Description

The Lead Sulfide (PbS) Sputtering Target is engineered for high-performance precision sputtering applications. Manufactured with high purity (≥99%) PbS and expert craftsmanship, it ensures consistent sputtering performance for thin film deposition. Its customizable shapes (discs or custom-made) provide versatility for integration into various industrial processes. Compatible with RF, RF-R, and DC sputtering systems, this target delivers flexibility and energy efficiency for optimum results. Ideal for semiconductor, optoelectronics, and advanced coating applications, it supports reliable manufacturing and innovative research.

Lead Sulfide (PbS) Sputtering Target Applications

· Thin Film Deposition: Essential for semiconductor and optoelectronics manufacturing.
· Surface Coatings: Utilized for producing high-quality optical and protective coatings.
· Microelectronics Fabrication: Integral in the production of micro-scale electronic components.
· Research and Development: Serves as a reliable material for experimental sputtering and advanced materials studies.

Lead Sulfide (PbS) Sputtering Target Packing

Our Lead Sulfide (PbS) Sputtering Targets are precision-engineered and handled with utmost care to preserve their quality. They are packaged using antistatic, moisture-proof materials to maintain integrity during storage and transportation. Customized size options are available to meet specific client requirements.

Frequently Asked Questions

Q: What sputtering methods are compatible with this target?
A: This target supports RF, RF-R, and DC sputtering processes.

Q: What is the purity level of the PbS used in the sputtering target?
A: The PbS used in our target has a purity of ≥99%.

Q: Are custom shapes available for this sputtering target?
A: Yes, in addition to standard disc shapes, custom-made options are available upon request.

Q: What industrial applications benefit most from this product?
A: It is widely used for thin film deposition, semiconductor manufacturing, microelectronics fabrication, and advanced coating applications.

Q: How should the sputtering target be handled and stored?
A: The target should be handled with antistatic precautions and stored in a moisture-proof environment to maintain optimal quality.