ST0285 Silicon Sulfide (SiS₂) Sputtering Target

Silicon Sulfide (SiS₂) Sputtering Target Description

The Silicon Sulfide (SiS₂) sputtering target is developed for precision applications in thin film deposition and sputtering processes. With a purity of ≥99%, this high-performance sputtering target is produced to deliver consistent and reliable results, making it suitable for both research and industrial production. Its customisable forms, including standard discs or bespoke designs, ensure versatility in application and optimal compatibility with various sputtering systems.

Silicon Sulfide (SiS₂) Sputtering Target Applications

- Microelectronics: Ideal for the deposition of thin films in semiconductor devices and circuit manufacturing.
- Optical Coatings: Used for manufacturing high-quality optical filters and sensor components.
- Research Laboratories: Provides reliable material for experimental deposition processes and material studies.
- Energy Devices: Utilised in the production of photovoltaic cells and other energy conversion devices.
- Industrial Coatings: Suitable for protective surface treatments for specialised machinery and tools.

Silicon Sulfide (SiS₂) Sputtering Target Packing

Our Silicon Sulfide (SiS₂) sputtering targets are meticulously packaged to ensure product integrity from production to application. Each unit is securely packed in an antistatic protective packaging to prevent contamination and physical damage. The packaging options are tailored to the specific shipping and handling requirements to ensure targets arrive in pristine condition.

Frequently Asked Questions

Q: What are the main applications of Silicon Sulfide (SiS₂) sputtering targets?
A: They are primarily used for thin film deposition for microelectronic devices, optical coatings, research experiments, and energy conversion applications.

Q: How does the high purity (≥99%) of the SiS₂ target affect its performance?
A: A purity level of ≥99% minimises impurities that could adversely affect film quality or sputter efficiency, thereby ensuring consistent and high-performance results for critical applications.

Q: Can the forms of the Silicon Sulfide (SiS₂) sputtering targets be customised?
A: Yes, in addition to standard disc shapes, the targets can be tailored to specific custom specifications to meet particular design and equipment requirements.

Q: What precautions should be taken when handling Silicon Sulfide (SiS₂) sputtering targets?
A: It is important to handle these targets carefully, implement antistatic measures, and wear appropriate protective equipment to avoid contamination or physical damage during installation and operation.

Q: Are there special storage requirements for these sputtering targets?
A: The targets should be stored in a dry, temperature-controlled environment and in their original protective packaging to maintain their integrity and optimal performance over extended periods.